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首页> 外文期刊>Journal of Vacuum Science & Technology >Investigation of finish cut of microelectrodischarge milling for nanosurface finish
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Investigation of finish cut of microelectrodischarge milling for nanosurface finish

机译:微放电磨削纳米表面光洁度的研究

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摘要

In this article, the machining conditions to achieve nanometric surface roughness in finish cut microelectrodischarge milling were investigated. For a constant gap voltage, the effect of feed rate and capacitance was studied on average surface roughness (R_a) and maximum peak-to-valley roughness height (R_y). Statistical models were developed using a three-level, two-factor experimental design. The developed models minimized R_a and R_y by desirability function approach. Maximum desirability was found to be more than 98%. The minimum values of R_a and R_y were 23 and 173 nm, respectively, for 1.00 μm s~(-1) feed rate and 0.01 nF capacitance. Verification experiments were conducted to check the accuracy of the models, where the responses were found to be very close to the predicted values. Thus, the developed models can be used to generate nanometric level surface finish, which are useful for many applications in microelectromechanical systems.
机译:在本文中,研究了在精切微电火花铣削中达到纳米表面粗糙度的加工条件。对于恒定的间隙电压,研究了进给速度和电容对平均表面粗糙度(R_a)和最大峰谷粗糙度高度(R_y)的影响。统计模型是使用三级,两因素实验设计开发的。开发的模型通过合意函数方法将R_a和R_y最小化。发现最大期望度大于98%。对于1.00μms〜(-1)的进给速度和0.01 nF电容,R_a和R_y的最小值分别为23和173 nm。进行了验证实验以检查模型的准确性,在该模型中,发现响应非常接近于预测值。因此,开发的模型可用于生成纳米级的表面光洁度,可用于微机电系统中的许多应用。

著录项

  • 来源
    《Journal of Vacuum Science & Technology》 |2009年第3期|1330-1334|共5页
  • 作者

    M. Y. Ali; R. Mehfuz;

  • 作者单位

    Department of Manufacturing and Materials Engineering, International Islamic University Malaysia, P.O. Box 10, 50728 Kuala Lumpur, Malaysia;

    Department of Manufacturing and Materials Engineering, International Islamic University Malaysia, P.O. Box 10, 50728 Kuala Lumpur, Malaysia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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