Development of edge field emission old cathodes based on low work function Cu-Li alloy coatings

摘要

Vertical edge emitter arrays of thin walled (500-8000 A) hollow cylinders have been fabricated by the deposition of Cu-20 at. /100 Li alloy (Cu_4Li) thin films on arrays of Si posts, followed by selective etching of the Si core. What remains is a hollow cylinder of cu_4Li, where the thickness of the emitting edge is determined by the deposited film thickness. Additionally, lateral edge emitters were fabricated from arrays of holes in SiO_2 or Si_3N_4 films on flat Si surfaces.