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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structure >Differential algebraic theory and calculation for arbitrary high order aberrations of a bipotential electrostatic lens
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Differential algebraic theory and calculation for arbitrary high order aberrations of a bipotential electrostatic lens

机译:微分代数理论和双电势静电透镜任意高阶像差的计算

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摘要

Differential algebraic method is a powerful technique in computer numerical analysis based on nonstandard analysis and formal series theory. It can compute arbitrary high order derivatives with excellent accuracy. When applied to nonlinear dynamics systems, the arbitrary high order transfer properties of the system can be derived directly. In this article, the principle of differential algebraic method is applied to calculate high order aberrations of a bipotential electrostatic electron lens. All the third order geometric aberration coefficients of the bipotential electrostatic lens have been calculated. The patterns of the third order aberrations and the fifth order aberrations are also given, and some types of the fifth order aberrations are observed.
机译:微分代数法是一种基于非标准分析和形式级数论的强大的计算机数值分析技术。它可以以极好的精度计算任意的高阶导数。当应用于非线性动力学系统时,可以直接导出系统的任意高阶传递特性。本文采用微分代数法原理计算双电势静电电子透镜的高阶像差。已经计算了双电位静电透镜的所有三阶几何像差系数。还给出了三阶像差和五阶像差的图案,并且观察到某些类型的五阶像差。

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