首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Laser surface treatment of carbon nanotube cathodes for field emission displays with large diagonal size
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Laser surface treatment of carbon nanotube cathodes for field emission displays with large diagonal size

机译:碳纳米管阴极的激光表面处理,用于大对角线尺寸的场发射显示器

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Excimer lasers with various wavelengths, power densities and beam profiles, have been used to irradiate to carbon nanotube-cathodes (CNT-cathodes) for field emission displays (FEDs) with large diagonal size. KrF (248 nm) and XeCl (308 nm) lasers were used with average power densities varied from 3 to 9 MW/cm~2. The beam shapes of the laser beam were adjusted as a square spot of 8 X 8 mm~2 for the KrF laser and a stripe of 180 X 0.4 mm~2 for XeCl laser using a beam homogenizer. The emission characteristics of CNT-cathodes were improved after laser irradiation. The turn-on-field became as low as 0.7 V/μm and the emission current density became as high as 1.5 mA/cm~2 at an applied field of 2.5 V/μm by KrF laser irradiation with a power density of 4 MW/cm~2. Homogeneous emission-site distribution could be obtained by a square beam or a stripe beam processing with steps from 0.2 to 0.5 mm. The emission pattern became more homogeneous with increase in laser power density. The laser processing time for large diagonal sizes using a stripe beam of 365-200 X 0.4 mm~2 have been estimated, giving a processing time of 92-138 s for a cathode of diagonal size 60 in. with an aspect ratio of 4:3.
机译:具有各种波长,功率密度和光束轮廓的准分子激光器已被用来照射具有大对角线尺寸的场发射显示器(FED)的碳纳米管阴极(CNT阴极)。使用KrF(248 nm)和XeCl(308 nm)激光器,平均功率密度在3到9 MW / cm〜2之间变化。使用光束均化器将KrF激光器的激光束形状调整为8 X 8 mm〜2的正方形光斑,对于XeCl激光器将其调整为180 X 0.4 mm〜2的条纹。激光照射后,CNT阴极的发射特性得到改善。通过KrF激光辐照,功率密度为4 MW /μm,在2.5 V /μm的施加场下,导通场低至0.7 V /μm,发射电流密度高达1.5 mA / cm〜2厘米〜2。均一的发射位置分布可以通过方波或条带束处理以0.2到0.5 mm的步长获得。随着激光功率密度的增加,发射图案变得更加均匀。估计使用365-200 X 0.4 mm〜2的条纹光束对大对角线尺寸的激光加工时间,对于对角线尺寸为60英寸,纵横比为4的阴极,其加工时间为92-138 s。 3。

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