Rigid organic molds for nanoimprint lithography by replica molding of high glass transition temperature polymers

摘要

The glass transition of polycarbonate resins of high softness temperature is exploited to realize rigid polymeric replicas of master patterns, with no need for antisticking layers and applied pressure. Such replicas enable the transfer of patterns onto polymers having a lower glass-transition temperature by nanoimprint lithography. As a demonstration, we show the pattern transfer onto poly(methylmethacrylate), which demonstrates good fidelity and remarkable simplicity of the process. (C) 2004 American Vacuum Society.