首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Structural and magnetic properties of epitaxial Fe3Si/GaAs(001) hybrid structures
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Structural and magnetic properties of epitaxial Fe3Si/GaAs(001) hybrid structures

机译:外延Fe3Si / GaAs(001)杂化结构的结构和磁性

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The structural, electrical, and magnetic properties of Fe3Si/GaAs(001) hybrid structures with high crystalline and interfacial perfection are studied. The Fe3Si/GaAs(001) hybrid structures are fabricated by molecular beam epitaxy at 200 degreesC. The composition of the films, which can be regarded as a Heusler alloy, is tuned over a wide range of Si content. The high crystalline and interfacial perfection is correlated with the stable Fe3Si phase. The resistivity of the films shows a strong minimum at almost exact stoichiometry which can be explained by the perfection of the ordering of the Si atoms within the Fe3Si phase. The layers are ferromagnetic at room temperature with saturation magnetization values close to bulk Fe3Si. The layers show very small coercive fields which again is correlated with high crystalline and interfacial perfection of the layers within the Fe3Si phase. (C) 2004 American Vacuum Society.
机译:研究了具有高结晶度和界面完美性的Fe3Si / GaAs(001)杂化结构的结构,电学和磁性。 Fe3Si / GaAs(001)杂化结构是在200℃下通过分子束外延制造的。可以在很宽的Si含量范围内调整膜的成分,可以将其视为Heusler合金。高结晶度和界面完美度与稳定的Fe3Si相相关。膜的电阻率在几乎精确的化学计量比下显示出很强的最小值,这可以用Fe3Si相中Si原子的有序性完美来解释。这些层在室温下是铁磁性的,其饱和磁化强度值接近于整体Fe3Si。这些层显示出非常小的矫顽场,这又与Fe3Si相中各层的高结晶度和界面完善性有关。 (C)2004年美国真空学会。

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