Summary Abstract: Studies of the etching of Si, SiO2, and Mo by carbon fluorine compounds using real time Auger spectroscopy

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Summary Abstract: Studies of the etching of Si, SiO2, and Mo by carbon fluorine compounds using real time Auger spectroscopy

机译：摘要：使用实时俄歇光谱研究碳氟化合物对硅，硅和钼的蚀刻

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《Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 》 |1985年第3期| P.803-803| 共1页
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1. Summary Abstract: A carbon Auger line shape study of nitroaromatic explosives [J] . Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 1984 ,第2期

机译：摘要：硝基芳族炸药的碳俄歇线形研究
2. Summary Abstract: Chemical processes in fluorine‐based etching reactions [J] . Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 1985 ,第3期

机译：摘要摘要：氟基蚀刻反应中的化学过程
3. Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes [J] . Numazawa Satoshi, Machida Ken, Isobe Michiro, Japanese journal of applied physics . 2016 ,第11期

机译：Si，SiO2和Si3N4蚀刻过程中氟自由基多层吸附机理的分子动力学研究
4. Detection of carbon-fluorine bonds in organofluorine compounds by Raman spectroscopy using a co [C] . Clay M. Sharts, California State Univ./San Diego, La Mesa, Electro-Optic, Integrated Optic, and Electronic Technologies for Online Chemical Process Monitoring . 1998

机译：使用钴的拉曼光谱检测有机氟化合物中的碳氟键
5. ELECTRON-BEAM INDUCED EFFECTS ON GAS ADSORPTION STUDIES UTILIZING AUGER ELECTRON-SPECTROSCOPY: CARBON-MONOXIDE AND OXYGEN ON SILICON. [D] . KIRBY, ROBERT EUGENE. 1973

机译：利用奥格电子光谱学研究电子束对气体吸附的影响：硅上的一氧化碳和氧。
6. Real-time carbon allocation into biogenic volatile organic compounds (BVOCs) and respiratory carbon dioxide (CO2) traced by PTR-TOF-MS, 13CO2 laser spectroscopy and 13C-pyruvate labelling [O] . Lukas Fasbender, Ana Maria Yáñez-Serrano, Jürgen Kreuzwieser, 2012

机译：通过PTR-TOF-MS，13CO2激光光谱和13C-丙酮酸盐标记追踪的实时碳分配到生物挥发性有机化合物（BVOC）和呼吸二氧化碳（CO2）中
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Summary Abstract: Studies of the etching of Si, SiO2, and Mo by carbon fluorine compounds using real time Auger spectroscopy

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