Issued between July 1, 2004 andnSept 30, 2004nPrepared by Jirˇı´ Mateˇjı´cˇek, Institute ofnPlasma Physics, Za Slovankou 3, 18221nPraha 8, Czech Republic; tel: +420-266n053 307; e-mail: jmatejic@ipp.cas.cz.nAdapted with permission from Delphion,nhttp://www.delphion.com.nEP denotes European patent, US denotesnUnited States patent, WO denotes WorldnIntellectual Property Organizationnapplication. Due to differences in databases,nnot all data are available forneach patent. The information has thenfollowing format: Title, Abstract, Patentnnumber, Inventors, Company, IssuedFiled dates.
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