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Distribution of dislocation source length and the size dependent yield strength in freestanding thin films

机译:独立薄膜中位错源长度的分布及其与尺寸有关的屈服强度

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摘要

A method is proposed to estimate the size-dependent yield strength of columnar-grained freestanding thin films. The estimate relies on assuming a distribution of the size of Frank-Read sources, which is then translated into a log-normal distribution of the source strength, depending on film thickness, grain size and theoretical strength of the material, augmented with a single fit parameter. Two-dimensional discrete dislocation plasticity (DDP) simulations are carried out for two sets of Cu films and the fit parameter is determined from independent experiments. Subsequent DDP predictions of the stress-strain curves in comparison with the corresponding experimental data show excellent agreement of initial yield strength and hardening rate for films of varying film thickness and grain size. Having thus demonstrated the power of the proposed strength distribution, it is shown that the mode of this distribution governs the most effective source strength. This is then used to suggest a method to estimate the yield strength of thin films as a function of film thickness and grain size. Simple maps are presented that are in very good agreement with recent experimental results for Cu thin films.
机译:提出了一种估计圆柱状独立薄膜的尺寸依赖性屈服强度的方法。估算依赖于假设Frank-Read光源尺寸的分布,然后将其转换为光源强度的对数正态分布,具体取决于薄膜厚度,晶粒尺寸和材料的理论强度,并通过一次拟合来增强参数。对两组铜膜进行了二维离散位错可塑性(DDP)模拟,拟合参数由独立实验确定。随后的DDP预测的应力-应变曲线与相应的实验数据比较表明,对于不同膜厚和晶粒尺寸的膜,其初始屈服强度和硬化速率具有极好的一致性。因此,在证明了所提出的强度分布的力量之后,表明了这种分布的模式支配着最有效的源强度。然后,这可用于建议一种根据薄膜厚度和晶粒尺寸估算薄膜屈服强度的方法。提出了简单的图,这些图与Cu薄膜的最新实验结果非常吻合。

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