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A Design Strategy for Intrinsically Stretchable High-Performance Polymer Semiconductors: Incorporating Conjugated Rigid Fused-Rings with Bulky Side Groups

机译:具有本质上拉伸高性能高性能半导体的设计策略:将共轭刚性熔合环掺入庞大的侧基

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摘要

Strategies to improve stretchability of polymer semiconductors, such as introducing flexible conjugation-breakers or adding flexible blocks, usually result in degraded electrical properties. In this work, we propose a concept to address this limitation, by introducing conjugated rigid fused-rings with optimized bulky side groups and maintaining a conjugated polymer backbone. Specifically, we investigated two classes of rigid fused-ring systems, namely, benzene-substituted dibenzothiopheno[6,5-b:6',5'-f]thieno[3,2-b]thiophene (Ph-DBTTT) and indacenodi-thiophene (IDT) systems, and identified molecules displaying optimized electrical and mechanical properties. In the IDT system, the polymer PIDT-3T-OC12-10% showed promising electrical and mechanical properties. In fully stretchable transistors, the polymer PIDT-3T-OC12-10% showed a mobility of 0.27 cm~2 V~(-1) s~(-1) at 75% strain and maintained its mobility after being subjected to hundreds of stretching-releasing cycles at 25% strain. Our results underscore the intimate correlation between chemical structures, mechanical properties, and charge carrier mobility for polymer semiconductors. Our described molecular design approach will help to expedite the next generation of intrinsically stretchable high-performance polymer semiconductors.
机译:提高高分子半导体拉伸性的策略,例如引入柔性共轭破坏器或添加柔性块,通常导致有降级的电性能。在这项工作中,我们提出了一种解决这种限制的概念,通过用优化的庞大侧组引入缀合的刚性熔合环并保持共轭聚合物主链。具体而言,我们研究了两类刚性熔环系统,即苯取代的二苯并噻吩[6,5-B:6',5'-F] Thieno [3,2-B]噻吩(pH-DBTTT)和吲哚代集-Thisophene(IDT)系统,并鉴定出显示优化的电气和机械性能的分子。在IDT系统中,聚合物PIDT-3T-OC12-10%显示有前景的电气和机械性能。在完全可伸缩的晶体管中,聚合物PIDT-3T-OC12-10%显示0.27cm〜2V〜(-1)S〜(-1)的迁移率,在75%的菌株下保持,并在经受数百个拉伸后保持其移动性 - 在25%菌株下进行循环。我们的结果强调了化学结构,机械性能和聚合物半导体的电荷载流子迁移率之间的亲密相关性。我们所描述的分子设计方法将有助于加快下一代内部可拉伸的高性能聚合物半导体。

著录项

  • 来源
    《Journal of the American Chemical Society》 |2021年第30期|11679-11689|共11页
  • 作者单位

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Materials Science and Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Materials Science and Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Samsung Advanced Institute of Technology Samsung Electronics Suwon 16678 South Korea;

    Samsung Advanced Institute of Technology Samsung Electronics Suwon 16678 South Korea;

    Samsung Advanced Institute of Technology Samsung Electronics Suwon 16678 South Korea;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

    Department of Chemical Engineering Stanford University Stanford California 94305 United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-19 03:03:23

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