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首页> 外文期刊>Journal of the American Chemical Society >Highly Productive Propane Dehydrogenation Catalyst Using Silica-Supported Ga-Pt Nanoparticles Generated from Single-Sites
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Highly Productive Propane Dehydrogenation Catalyst Using Silica-Supported Ga-Pt Nanoparticles Generated from Single-Sites

机译:使用由单点生成的二氧化硅支撑的Ga-Pt纳米颗粒生产高效率的丙烷脱氢催化剂

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摘要

The development of more effective alkane dehydrogenation catalysts is a key technological challenge for the production of olefins from shale gas, an abundant source of light hydrocarbons. Surface organometallic chemistry provides an original approach to generate nanometric Ga Pt bimetallic particles supported on partially dehydroxylated silica containing gallium single-sites, which displays high activity, selectivity, and stability in propane dehydrogenation. This catalyst was prepared via sequential grafting of a platinum precursor onto silica possessing site-isolated gallium sites followed by H-2 reduction. Monitoring generation of the reduced species, (Ga delta+Pt0)/SiO2, via in situ X-ray absorption spectroscopy reveals formation of a GaxPt (0.5 x 0.9) alloy with a fraction of gallium remaining as isolated sites. This bimetallic material exhibits catalytic performance that far surpasses each of the individual components and other reported Ga-Pt based catalysts; this is attributed to the highly dispersed GaxPt alloyed structure on a support with low Bronsted acidity containing gallium single-sites.
机译:对于从页岩气生产烯烃(轻质烃的丰富来源)生产烯烃而言,开发更有效的烷烃脱氢催化剂是一项关键的技术挑战。表面有机金属化学提供了一种原始方法来生成纳米Ga Pt双金属颗粒,该颗粒负载在含镓单部位的部分脱羟基二氧化硅上,在丙烷脱氢中表现出高活性,选择性和稳定性。通过将铂前体顺序接枝到具有位点隔离的镓位点的二氧化硅上,然后进行H-2还原,制备该催化剂。通过原位X射线吸收光谱法监测还原物种(Ga delta + Pt0)/ SiO2的产生,揭示了GaxPt(0.5

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  • 来源
    《Journal of the American Chemical Society》 |2018年第37期|11674-11679|共6页
  • 作者单位

    Swiss Fed Inst Technol, Dept Chem & Appl Biosci, Vladimir Prelog Weg 1-5, CH-8093 Zurich, Switzerland;

    Swiss Fed Inst Technol, Dept Chem & Appl Biosci, Vladimir Prelog Weg 1-5, CH-8093 Zurich, Switzerland;

    Swiss Fed Inst Technol, Dept Chem & Appl Biosci, Vladimir Prelog Weg 1-5, CH-8093 Zurich, Switzerland;

    Purdue Univ, Birck Nanotechnol Ctr, 1205 West State St, W Lafayette, IN 47907 USA;

    Paul Scherrer Inst, CH-5232 Villigen, Switzerland;

    Swiss Fed Inst Technol, Dept Chem & Appl Biosci, Vladimir Prelog Weg 1-5, CH-8093 Zurich, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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