Nanotransfer Printing Using Plasma Etched Silicon Stamps and Mediated by in Situ Deposited Fluoropolymer

摘要

This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.