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Direct Pathway to Molecular Photodissociation on Metal Surfaces Using Visible Light

机译:使用可见光在金属表面进行分子光解离的直接途径

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摘要

We demonstrate molecular photodissociation on single-crystalline metal substrates, driven by visible-light irradiation. The visible-light-induced photodissociation on metal substrates has long been thought to never occur, either because visible-light energy is much smaller than the optical energy gap between the frontier electronic states of the molecule or because the molecular excited states have short lifetimes due to the strong hybridization between the adsorbate molecular orbitals (MOs) and metal substrate. The S-S bond in dimethyl disulfide adsorbed on both Cu(111) and Ag(111) surfaces was dissociated through direct electronic excitation from the HOMO-derived MO (the nonbonding lone-pair type orbitals on the S atoms (ns)) to the LUMO-derived MO (the antibonding orbital localized on the S-S bond (σ~*_(ss))) by irradiation with visible light. A combination of scanning tunneling microscopy and density functional theory calculations revealed that visible-light-induced photodissociation becomes possible due to the interfacial electronic structures constructed by the hybridization between molecular orbitals and the metal substrate states. The molecule-metal hybridization decreases the gap between the HOMO- and LUMO-derived MOs into the visible-light energy region and forms LUMO-derived MOs that have less overlap with the metal substrate, which results in longer excited-state lifetimes.
机译:我们证明了在可见光辐射的驱动下,单晶金属基板上的分子光解离。长期以来,人们一直认为不会在金属基材上发生可见光诱导的光解离,这是因为可见光能量远小于分子前沿电子态之间的光能隙,或者因为分子激发态的寿命短吸附分子轨道(MOs)与金属底物之间的强杂交。通过直接电子激发从HOMO衍生的MO(S原子(ns)上的非键孤对型轨道)到LUMO上吸附在Cu(111)和Ag(111)表面上的二甲基二硫中的SS键解离-通过可见光照射获得的MO(位于SS键(σ〜* _(ss))上的反键轨道)。扫描隧道显微镜和密度泛函理论计算的结合表明,由于分子轨道与金属基态之间杂化而形成的界面电子结构,可见光诱导的光解离成为可能。分子-金属杂交减小了HOMO和LUMO衍生的MOs到可见光能量区域之间的间隙,并形成了LUMO衍生的MOs,它与金属基底的重叠较少,这导致更长的激发态寿命。

著录项

  • 来源
    《Journal of the American Chemical Society》 |2017年第8期|3115-3121|共7页
  • 作者单位

    Surface and Interface Science Laboratory, RIKEN, Wako, Saitama 351-0198, Japan;

    Department of Chemistry, University of Ulsan, 93 Daehak-ro, Nam-gu, Ulsan 680-749, Republic of Korea;

    Graduate School of Science and Engineering, University of Toyama, Toyama 930-8555, Japan;

    Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, Illinois 60607, United States;

    Surface and Interface Science Laboratory, RIKEN, Wako, Saitama 351-0198, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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