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首页> 外文期刊>Journal of Sol-Gel Science and Technology >Study of spin coated multilayer zirconia and silica films for non-quarterwavelength optical design based antireflection effect at 1,054 nm
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Study of spin coated multilayer zirconia and silica films for non-quarterwavelength optical design based antireflection effect at 1,054 nm

机译:基于1,054 nm的非四分之一波长光学设计的减反射效应的旋涂多层氧化锆和二氧化硅薄膜的研究

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摘要

A non-quarterwavelength optical design (design wavelength, λo = 1,054 nm) based antireflection (AR) coating was prepared by sol–gel spin coating technique. Two materials, zirconia and silica were chosen for the deposition of AR layers on borosilicate crown glass, refractive index (R. I. = 1.51). For this design, the bottom and middle layers were of zirconia with the R. I. range 1.941–1.958 while the top layer was of silica with R. I. 1.455. To understand the surface feature after each deposition, refractive index and physical thickness of the layers were measured ellipsometrically (λ = 632.8 nm) at different points over the area, 10 mm × 10 mm with an interval of 0.5 mm along the centre based perpendicular projection made on an imaginary chord. The surface feature was examined by plotting the measured values of the optical parameters against the displacement. The surface roughness decreased with increasing layers. This was verified by the study of AFM images of the layers. Specular reflection of the antireflection coated product at λ0 was comparable to that of the theoretically simulated curve.
机译:通过溶胶-凝胶旋涂技术制备了基于非四分之一波长的光学设计(设计波长,λ = 1,054 nm)。选择两种材料,氧化锆和二氧化硅用于在硼硅酸盐冠玻璃上沉积AR层,折射率(R. I. = 1.51)。对于此设计,底层和中间层是氧化锆,R。I.范围为1.941-1.958,而顶层是氧化硅,二氧化硅是R. I. 1.455。为了了解每次沉积后的表面特征,以椭圆偏光法(λ= 632.8 nm)在该区域的不同点上以10 mm×10 mm的间隔沿沿中心的垂直投影以0.5 mm的间隔进行椭偏测量(λ= 632.8 nm)用虚构的和弦制作。通过将光学参数的测量值相对于位移作图来检查表面特征。随着层数的增加,表面粗糙度降低。通过对层的AFM图像的研究证实了这一点。抗反射涂层产品在λ 0 处的镜面反射与理论模拟曲线相当。

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