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Optical Properties of Spin-Coated TiO2Antireflection Films on Textured Single-Crystalline Silicon Substrates

机译:纺织单晶硅基板上旋涂的TiO2Antireflection膜的光学性质

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摘要

Antireflection coating (ARC) prepared by a wet process is beneficial for low cost fabrication of photovoltaic cells. In this study, we investigated optical properties and morphologies of spin-coated TiO2 ARCs on alkaline textured single-crystalline silicon wafers. Reflectance spectra of the spin-coated ARCs on alkaline textured silicon wafers exhibit no interferences and low reflectance values in the entire visible range. We modeled the structures of the spin-coated films for ray tracing numerical calculation and compared numerically calculated reflectance spectra with the experimental results. This is the first report to clarify the novel optical properties experimentally and theoretically. Optical properties of the spin-coated ARCs without interference are due to the fractional nonuniformity of the thickness of the spin-coated ARCs that cancels out the interference of the incident light.
机译:通过湿法制备的抗反射涂层(ARC)是有利于光伏电池的低成本制造的有益。在该研究中,我们研究了碱性纹理单晶硅晶片上的旋涂的TiO2弧的光学性质和形态。碱性纹理硅晶片上的旋涂弧的反射光谱在整个可见范围内没有干扰和低反射率值。我们建模了旋涂膜的结构进行射线跟踪数值计算,并使用实验结果比较数值计算的反射光谱。这是第一个在实验和理论上澄清新型光学性质的报告。没有干涉的旋涂电弧的光学性质是由于旋涂电弧的厚度的分数不均匀,这些弧形抵消了入射光的干扰。

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