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首页> 外文期刊>Journal of power sources >Ultra-high energy storage density and ultra-wide operating temperature range in Bi_2Zn_(2/3)Nb_(4/3)O_7 thin film as a novel lead-free capacitor
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Ultra-high energy storage density and ultra-wide operating temperature range in Bi_2Zn_(2/3)Nb_(4/3)O_7 thin film as a novel lead-free capacitor

机译:Bi_2zn_(2/3)Nb_(4/3)O_7薄膜中的超高储能密度和超宽工作温度范围作为新型无铅电容器

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摘要

Capacitor with high energy density, wide operating temperature range, large power density and environmental friendliness is strongly demanded in modern electrical and electronic devices. In this work, Bi2Zn2/3Nb4/3O7 (BZN) thin film as a novel lead-free material with ultra-high energy storage density and ultra-wide operating temperature range, is prepared by magnetron sputtering. Dielectric properties and electric breakdown strength depend on the substrate temperature, resulting in the change of energy storage performance. The dielectric constant and breakdown strength reach respectively 182 and 3.81 MV/cm for the BZN thin film prepared at 700 degrees C, while the maximum recoverable energy storage density (63.5 J/cm(3)) at 100 Hz is achieved. Moreover, the BZN thin films possess excellent thermal stability of energy storage properties in an ultra-wide temperature range (-150-250 degrees C)and strong fatigue endurance after 1 x 10(6) charge-discharge cycles. These results reveal that the BZN thin film can be a promising candidate for lead-free energy storage application in equipment working in harsh environment.
机译:在现代电气和电子设备中强烈要求高能量密度,宽工作温度范围,大功率密度和环境友好的电容器。在这项工作中,通过磁控溅射制备Bi2Zn2 / 3NB4 / 3O7(BZN)作为具有超高储能密度和超宽工作温度范围的新型无铅材料。介电性能和电击强度取决于基板温度,导致能量存储性能的变化。在700℃下制备的BZN薄膜的介电常数和击穿强度分别到达182和3.81mV / cm,而达到100Hz的最大可回收能量储存密度(63.5J / cm(3))。此外,BZN薄膜在超宽温度范围内具有优异的储能性能(-150-250℃),并且在1×10(6)次充电 - 放电循环后的强疲劳耐久性。这些结果表明,BZN薄膜可以是在苛刻环境中工作的设备中无铅储能应用的有希望的候选者。

著录项

  • 来源
    《Journal of power sources》 |2021年第15期|229879.1-229879.8|共8页
  • 作者单位

    Dongguan Univ Technol Sch Elect Engn & Intelligentizat Dongguan 523808 Guangdong Peoples R China;

    Tianjin Univ Sch Microelect Tianjin 300072 Peoples R China|Tianjin Univ Tianjin Key Lab Imaging & Sensing Microelect Tech Tianjin 300072 Peoples R China;

    Dalian Univ Technol Sch Mech Engn Dalia 116024 Liaoning Peoples R China;

    Tianjin Univ Sch Microelect Tianjin 300072 Peoples R China|Tianjin Univ Tianjin Key Lab Imaging & Sensing Microelect Tech Tianjin 300072 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Energy storage density; Operating temperature range; Bi2Zn2/3Nb4/3O7; Lead-free; Thin films;

    机译:储能密度;工作温度范围;Bi2zn2 / 3nb4 / 3o7;无铅;薄膜;

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