Development of R. F. Sputtered Cu/Si Multilayer Coatings For X-Ray mirror Applications

摘要

Single layers of Cuand Si and Cu/Si multilayers have been deposited on glass substrates kept at room temperature, by r.f. sputtering technique in Argon plasma. The films have been characterised by Small-Angle X-ray reflectometry at Mok_α(0.07107 A) and CuK_α (1.54 A) radiation and by Phase Modulated Ellipsometry in the spectral range of 300-800 nm. It has been found by the Small Angle X-ray reflectivity measurements that the sputtering system is able to produce high quality layers with very low roughness (<5 A).