AbstractAn aspherical lens is made by a thin-film coating technique. A special mask is placed between the evapo'/> Making aspherical lens by thin film deposition coated under vacuum
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Making aspherical lens by thin film deposition coated under vacuum

机译:通过真空镀膜沉积制备非球面透镜

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AbstractAn aspherical lens is made by a thin-film coating technique. A special mask is placed between the evaporation source and the substrate that is to be coated as an aspheric. The design principle of the mask is completely described. The final surface is tested by an interferometric double path auto-collimation measuring method. Less than 0.05λ rms of a wave (632.8 nm) of aberrations is achieved without much trial and error. The static mask is described and analysed by simulations of the film thickness theory, based on the assumption that atoms and molecules emitted by the source travel in straight lines to the substrates, which rotate about the central axis during films deposition. The design method can be practically used for all optical coatings produced by vacuum deposition. The solution of a mask shape is unique for a stationary set of coating parameters. A set of coating parameters include the height of the apex of the dome above the source, the curvature radius of the dome, the distance from the source to the rotation axis of the dome, the emissive characteristics of the source which modify the cosine law of the surface source, the form and area of the source. The static mask designed by this method can be used for correction optical element’s aberrations. Dioxide silicon thin film was evaporated with 6 µm thickness on BK7 optical glass and fused quartz optical glass for apherization refractive optical elements. The SiO2film was tested for stability and environmental durability, it achieved good sticking and passed the test without peeling or cracking.
机译: Abstract 非球面透镜是通过薄膜镀膜技术制成的。在蒸发源和要涂覆为非球面的基材之间放置一个特殊的掩模。全面介绍了面罩的设计原理。最终表面通过干涉双路径自动准直测量方法进行测试。无需太多的反复试验即可获得小于0.05λrms的像差波(632.8 nm)。通过假设源发出的原子和分子沿直线行进到基板,并在膜沉积过程中绕中心轴旋转,通过对膜厚理论的模拟来描述和分析静态掩模。该设计方法可实际用于通过真空沉积生产的所有光学涂层。掩模形状的解决方案对于固定的一组涂层参数而言是唯一的。一组涂层参数包括圆顶在光源上方的顶点高度,圆顶的曲率半径,从光源到圆顶旋转轴的距离,光源的发射特性,这些特性改变了余弦定律。表面源,源的形式和面积。通过这种方法设计的静态掩模可用于校正光学元件的像差。在BK7光学玻璃和熔融石英光学玻璃上蒸镀了厚度为6 µm的二氧化硅薄膜,用于球面折射光学元件。对SiO 2 薄膜进行了稳定性和环境耐久性测试,获得了良好的粘附性,并且通过了测试,没有剥离或破裂。

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