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Study of Processability of Cu/Ni Bilayers Using Molecular Dynamics Simulations

机译:使用分子动力学模拟研究Cu / Ni双层薄膜的可加工性

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摘要

Nanoscratching and nanoindentation simulations are performed to study the processability of Cu/Ni bilayers with interfaces using molecular dynamics (MD) method. Single crystals Cu and Ni are served as comparisons. In the nanoscratching processes, the interfaces of Cu/Ni bilayers appear as a barrier of dislocations gliding, and lead to larger friction forces and normal forces. For single crystals and bilayers, both their friction forces and normal forces increase with the increasement of scratch velocity at 100-300 m/s. Friction coefficients under scratching processes are calculated, and they are smaller than macrosacle scratching process because of coating effects of nano-chips on the tool. The effects are analyzed by conducting both molecular dynamics simulations in nanoscale and finite element simulations (FES) in macroscale. In the indentation process, the processing properties of Cu-Ni and Ni-Cu bilayers are different from each other, and their indentation forces are both larger than their single crystals. Recovery deformation takes place during the relaxation stage. When the tool is unloading, some workpiece atoms adhere to the tool. The simulation results of the two nanoscale machining processes reveal the strengthening mechanism of interface, and show comprehensive processability of metal bilayers.
机译:进行了纳米划痕和纳米压痕仿真,以使用分子动力学(MD)方法研究具有界面的Cu / Ni双层的可加工性。将Cu和Ni单晶用作比较。在纳米划痕过程中,Cu / Ni双层界面作为位错滑动的障碍出现,并导致更大的摩擦力和法向力。对于单晶和双层,其摩擦力和法向力都随着划痕速度(100-300 m / s)的增加而增加。计算了在刮擦过程中的摩擦系数,由于纳米芯片在工具上的涂层作用,其摩擦系数小于宏观刮擦过程。通过进行纳米尺度的分子动力学模拟和宏观尺度的有限元模拟(FES)来分析这些影响。在压痕过程中,Cu-Ni和Ni-Cu双层的加工性能互不相同,并且压痕力均大于其单晶。恢复变形发生在松弛阶段。卸载工具时,一些工件原子会附着在工具上。两种纳米加工过程的仿真结果揭示了界面的强化机理,并显示了金属双层的综合加工性能。

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