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Explicit Quantum Drain Current Model for Symmetric Double Gate MOSFETs

机译:对称双栅极MOSFET的显式量子漏极电流模型

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In this article, an analytical model for Double gate Metal Oxide Semiconductor Field Effect Transistor (DG MOSFET) is developed including Quantum effects. The Schrodinger-Poisson' s equation is used to develop the analytical Quantum model using Variational method. A mathematical expression for inversion charge density is obtained and the model was developed with quantum effects by means of oxide capacitance for different channel thickness and gate oxide thickness. Based on inversion charge density model the compact model is developed for transfer characteristics, transconductance and C-V curves of DG MOSFETs. The results of the model are compared to the simulated results. The comparison shows the accuracy of the proposed model.
机译:在本文中,开发了一种用于双栅极金属氧化物半导体场效应晶体管(DG MOSFET)的分析模型,包括量子效应。 Schrodinger-Poisson的等式用于使用变分法开发分析量子模型。获得用于反转电荷密度的数学表达,并且通过氧化物电容具有不同通道厚度和栅极氧化物厚度的量子效应来开发模型。基于反转电荷密度模型,开发了用于转移特性,跨导和DG MOSFET的C-V曲线的紧凑模型。模型的结果与模拟结果进行比较。比较显示了所提出的模型的准确性。

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