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首页> 外文期刊>Journal of microanolithography, MEMS, and MOEMS >Investigation of SU8 as a structural material for fabricating passive millimeter-wave and terahertz components
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Investigation of SU8 as a structural material for fabricating passive millimeter-wave and terahertz components

机译:SU8作为制造无源毫米波和太赫兹组件的结构材料的研究

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摘要

This paper provides a systematic review of the technical issues of SU8 fabrication for millimeter-wave and terahertz components based on research carried out at the University of Birmingham in the past decade. A design-for-manufacturability approach is followed. The flexibility of the SU8 process enables many device structures. Challenges and problems during fabrication will be discussed and demonstrated with examples. The measurement of the devices is also a significant challenge when the critical dimensions of the device shrink and special testing fixtures are needed in some cases. Finally, a brief overview of the issues discussed above is given for future guidance.
机译:本文基于过去十年在伯明翰大学进行的研究,对毫米波和太赫兹组件的SU8制造技术问题进行了系统的综述。遵循可制造性设计方法。 SU8工艺的灵活性使许多设备结构成为可能。将通过示例讨论和演示制造过程中的挑战和问题。当设备的关键尺寸缩小并且在某些情况下需要特殊的测试夹具时,设备的测量也是一个巨大的挑战。最后,对上述问题进行了简要概述,以备将来参考。

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  • 来源
    《Journal of microanolithography, MEMS, and MOEMS》 |2015年第4期|044507.1-044507.9|共9页
  • 作者单位

    University of Birmingham, School of Electronic, Electrical, and Systems Engineering, West Midlands B15 2TT, United Kingdom,University of Manchester, School of Materials, Manchester M13 9PL, United Kingdom;

    University of Birmingham, School of Electronic, Electrical, and Systems Engineering, West Midlands B15 2TT, United Kingdom;

    University of Greenwich, Faculty of Engineering and Sciences, Chatham, ME4 4TB Kent, United Kingdom;

    University of Birmingham, School of Electronic, Electrical, and Systems Engineering, West Midlands B15 2TT, United Kingdom;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SU8 photolithography; millimeter-wave and terahertz components.;

    机译:SU8光刻;毫米波和太赫兹分量。;

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