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Preparation and magnetic properties of the CoFe2O4 thin films on Si substrate by sol-gel technique

机译:溶胶-凝胶技术在Si衬底上制备CoFe2 O4 薄膜及其磁性

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A stable precursor for CoFe2O4 thin film was prepared by sol-gel technique from the aqueous solution of FeCl3·6H2O and CoCl2·6H2O. Sol was deposited on a naturally oxidized silicon-substrate by spinning technique (2000 rpm) and heat treated at different temperatures ranging from 700 to 1100 °C. Thickness of the films was controlled in the range of 400–500 nm and all the films were characterized by using XRD and SEM. The effects of temperature and the composition on the formation of CoFe2O4 thin film were also studied. Films obtained at relatively lower temperature showed multi-phases of α-Fe2O3, CoFe2O4 and CoO while the formation of CoFe2O4 phase increases with increasing temperature. Furthermore, the composition of the solution in mol% has great role on the formation of CoFe2O4 films and the film containing 50 mol% of Co2+ exhibited CoFe2O4 mono-phase. Surface morphology of the films was studied by scanning electron microscope (SEM). Magnetic properties of the films, studied by using vibrating sample magnetometer (VSM), showed relatively high saturation magnetization (8.04–22.21 kWb/m2) as well as high coercivity (44.59–63.30 kA/m). Saturation magnetization also increases with increasing heat treatment temperature.
机译:用FeCl3·6H2O和CoCl2·6H2水溶液通过溶胶-凝胶技术制备了稳定的CoFe2 O4 薄膜前驱体。 sub> O。通过旋转技术(2000 rpm)将溶胶沉积在自然氧化的硅基板上,并在700至1100°C的不同温度下进行热处理。膜的厚度控制在400-500 nm范围内,所有膜均使用XRD和SEM表征。研究了温度和组成对CoFe2 O4 薄膜形成的影响。在相对较低的温度下获得的膜显示出α-Fe2 O3 ,CoFe2 O4 和CoO的多相,而CoFe2 O4 的形成相随温度升高而增加。此外,以摩尔%计的溶液组成对CoFe2 O4 膜的形成具有重要作用,而含有50mol%Co2 + 的膜表现出CoFe2 O4 单相。通过扫描电子显微镜(SEM)研究了膜的表面形态。使用振动样品磁力计(VSM)研究的薄膜的磁性能显示出相对较高的饱和磁化强度(8.04–22.21 kWb / m2 )和高矫顽力(44.59–63.30 kA / m)。饱和磁化强度也随着热处理温度的升高而增加。

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  • 来源
    《Journal of Materials Science 》 |2005年第16期| 4169-4172| 共4页
  • 作者单位

    Department of Applied Chemistry Faculty of Engineering Okayama UniversityAdvanced Materials Division Korea Research Institute of Chemical Technology;

    Department of Applied Chemistry Faculty of Engineering Okayama University;

    Department of Applied Chemistry Faculty of Engineering Okayama University;

    Department of Applied Chemistry Faculty of Engineering Okayama University;

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