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A model system for the optimization of lamination parameters of PTFE-based dielectrics and metal surfaces

机译:用于优化基于PTFE的电介质和金属表面的层压参数的模型系统

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In microelectronic packaging, organic dielectric materials continue to displace ceramic materials because of cost, reduced weight, and performance advantages. Because thermosetting dielectric composites have long found widespread use in printed wiring board (PWB) fabrication, they have been the components of choice for many organic chip carriers. Conversely, thermoplastic dielectrics, such as fluoropolymer (FP), and in particular poly(tetrafluoroethylene)-based dielectric composites (PTFE composites) have seldom found use in multilayer wiring packages in spite of their attractive electrical properties due to their processing challenges. In this paper, we report the use of a model system comprising pure PTFE film and Cr-coated copper surfaces to optimize the bonding process through lamination conditions for a fluoropolymer composite and chromium-coated copper surfaces and to study both the interface mechanics and its chemistry as a function of processing parameters. The significant finding of the investigation was the linkage between the macroscopic mechanical properties of the interface and the observable chemical alteration of the same under some lamination conditions. The relationship of the interface properties and the processing conditions extend a conceptual framework for the thermodynamics of the metal-polymer interface and the reliability of these electronic packages in their practical designs.
机译:在微电子封装中,由于成本,重量减轻和性能优势,有机介电材料继续取代陶瓷材料。由于热固性介电复合材料早已在印刷线路板(PWB)的制造中得到广泛使用,因此它们已成为许多有机芯片载体的首选组件。相反,尽管由于其加工挑战而具有吸引人的电性能,但是很少发现诸如含氟聚合物(FP)的热塑性电介质,特别是基于聚四氟乙烯的电介质复合材料(PTFE复合材料)被用于多层布线封装中。在本文中,我们报告了使用包含纯PTFE膜和镀铬铜表面的模型系统,通过含氟聚合物复合材料和镀铬铜表面的层压条件优化粘合过程,并研究了界面力学及其化学性质作为处理参数的函数。该研究的重要发现是在某些层压条件下,界面的宏观机械性能与其可观察到的化学变化之间的联系。界面特性和加工条件之间的关系为金属-聚合物界面的热力学以及这些电子封装在实际设计中的可靠性扩展了概念框架。

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