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首页> 外文期刊>Journal of Materials Science >Effect of film thickness on ferroelectric domain structure and properties of Pb(Zr0.35Ti0.65)O3/SrRuO3/SrTiO3 heterostructures
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Effect of film thickness on ferroelectric domain structure and properties of Pb(Zr0.35Ti0.65)O3/SrRuO3/SrTiO3 heterostructures

机译:膜厚对Pb(Zr 0.35 Ti 0.65 )O 3 / SrRuO 3 / SrTiO 3 异质结构

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摘要

Epitaxial Pb(Zr0.35Ti0.65)O3 (PZT) thin films with tetragonal symmetry and thicknesses ranging from 45 to 230 nm were grown at 540 °C on SrRuO3-coated (001)SrTiO3 substrates by pulse-injected metalorganic chemical vapor deposition. The effect of the film thickness on the ferroelectric domain structure and the dielectric and ferroelectric properties were systematically investigated. Domain structure analysis of epitaxial PZT films was accomplished with high-resolution X-ray diffraction reciprocal space mapping and high-resolution transmission electron microscopy. Fully polar-axis (c-axis)-oriented epitaxial PZT thin films with high ferroelectric polarization values [e.g., remanent polarization (P r) ~ 90 μC/cm2] were observed for film thicknesses below 70 nm. Films thicker than 70 nm had a c/a/c/a polydomain structure and the relative volume fraction of c-domains monotonously decreased to about 72% on increasing the film thickness up to 230 nm , and finally P r diminished to about 64 μC/cm2 for the 230-nm-thick epitaxial film. These polarization values were in good agreement with the estimated values taking into account the volume fraction of the c-axis-oriented domains while assuming a negligible contribution of 90° domain reorientation caused by an externally applied electric field.
机译:生长具有四方对称,厚度为45至230 nm的外延Pb(Zr 0.35 Ti 0.65 )O 3 (PZT)薄膜通过脉冲注入金属有机化学气相沉积法在涂覆SrRuO 3 (001)SrTiO 3 的衬底上达到540°C。系统地研究了膜厚度对铁电畴结构以及介电和铁电性能的影响。外延PZT薄膜的畴结构分析是通过高分辨率X射线衍射互易空间映射和高分辨率透射电子显微镜完成的。具有高铁电极化值[例如剩余极化(P r )〜90μC/ cm 2 ]的全极轴(c轴)取向外延PZT薄膜观察到低于70nm的膜厚度。厚度大于70 nm的薄膜具有ac / a / c / a多畴结构,当膜厚增加到230 nm时,c畴的相对体积分数单调降低至约72%,最后达到P r 。这些极化值与考虑到c轴取向畴的体积分数的估计值非常吻合,同时假设由外部施加的电场引起的90°畴取向的贡献可忽略不计。

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