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首页> 外文期刊>Journal of Materials Science >Electrical conductivity and dielectric properties of cadmium thiogallate CdGa2S4 thin films
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Electrical conductivity and dielectric properties of cadmium thiogallate CdGa2S4 thin films

机译:硫代镓酸镉CdGa2 S4 薄膜的电导率和介电性能

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摘要

Cadmium thiogallate CdGa2S4 thin films were prepared using a conventional thermal evaporation technique. The dark electrical resistivity calculations were carried out at different elevated temperatures in the range 303–423 K and in thickness range 235–457 nm. The ac conductivity and dielectric properties of CdGa2S4 film with thickness 457 nm has been studied as a function of temperature in the range from 303 to 383 K and in frequency range from 174 Hz to 1.4 MHz. The experimental results indicate that σac(ω) is proportional to ω s and s ranges from 0.674 to 0.804. It was found that s increases by increasing temperature. The results obtained are discussed in terms of the non overlapping small polaron tunneling model. The dielectric constant (ε′) and dielectric loss (ε″) were found to be decreased by increasing frequency and increased by increasing temperature. The maximum barrier height (W m) was estimated from the analysis of the dielectric loss (ε″) according to Giuntini’s equation. Its value for the as-deposited films was found to be 0.294 eV.
机译:采用常规的热蒸发技术制备了硫代镓酸镉CdGa2 S4 薄膜。暗电阻率计算是在303–423 K范围和厚度235–457 nm的不同高温下进行的。研究了厚度为457 nm的CdGa2 S4 薄膜的交流电导率和介电性能,其与温度在303至383 K以及频率在174 Hz至1.4 MHz范围内的关系。实验结果表明,σac(ω)与ωs 成正比,且s的范围为0.674至0.804。已经发现,s随着温度的升高而增加。根据非重叠小极化子隧穿模型讨论了获得的结果。发现介电常数(ε')和介电损耗(ε'')随着频率的增加而降低,而随着温度的升高而增加。根据Giuntini的方程,通过对介电损耗(ε“)的分析来估计最大势垒高度(W m )。发现其对于沉积膜的值为0.294eV。

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  • 来源
    《Journal of Materials Science 》 |2011年第17期| p.5743-5750| 共8页
  • 作者单位

    Faculty of Education, Physics Department, Thin Film Laboratory, Ain Shams University, Cairo, 11757, Egypt;

    Faculty of Education, Physics Department, Thin Film Laboratory, Ain Shams University, Cairo, 11757, Egypt;

    Faculty of Education, Physics Department, Thin Film Laboratory, Ain Shams University, Cairo, 11757, Egypt;

    Faculty of Education, Physics Department, Thin Film Laboratory, Ain Shams University, Cairo, 11757, Egypt;

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