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机译:退火对掺Gd的ZnO薄膜的结构,电磁性能的影响
National Isotope Centre, GNS Science, P.O. Box 31312, Lower Hutt, New Zealand;
National Isotope Centre, GNS Science, P.O. Box 31312, Lower Hutt, New Zealand;
School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand;
The MacDiarmid Institute for Advanced Materials and Nanotechnology, Wellington, New Zealand;
National Isotope Centre, GNS Science, P.O. Box 31312, Lower Hutt, New Zealand;
Inst Bio21, University of Melbourne, Melbourne, VIC, 3010, Australia;
Centre for Microscopy, Characterization and Analysis, The University of Western Australia, Crawley, WA, 6009, Australia;
机译:退火对掺Gd的ZnO薄膜的结构,电磁性能的影响
机译:镁掺杂水平和退火温度引起的高c轴取向ZnO:Mg薄膜和Al / ZnO:Mg / p-Si / Al异质结二极管的结构,光学和电学性质
机译:Mg掺杂水平和退火温度诱导高度C轴取向ZnO:Mg薄膜和Al / ZnO:Mg / P-Si / Al异质结二极管的结构,光学和电性能
机译:通过连续离子层吸附和反应(Silly)技术对生长ZnO薄膜结构和光学性能的影响
机译:原位热退火工艺对脉冲激光沉积制造CDS Cdte薄膜太阳能电池结构,光学和电性能的影响
机译:快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
机译:沉积退火对ZnO / Ag / ZnO薄膜的结构,电气和光学性能的影响