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首页> 外文期刊>Journal of Materials Science. Materials in Electronics >Structural properties of TiO_(2)-WO_(3) thin films prepared by r.f. sputtering
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Structural properties of TiO_(2)-WO_(3) thin films prepared by r.f. sputtering

机译:射频制备TiO_(2)-WO_(3)薄膜的结构性能溅镀

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摘要

TiO_(2)-WO_(3) thin films were prepared by radio frequency (r.f.) reactive sputtering from metallic target. Structural and morphological properties of the thin films have been studied through X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The influence of the annealing on the phase composition TiO_(2)-WO_(3) system was studied. The binding energies of titanium and tungsten are characteristic for Ti~(4+) and W~(6+). The influence of tungsten on anatase-rutile phase transition in TiO_(2) was observed. The structural modeling has been performed to account the preferred orientation in tungsten doped titanium oxide.
机译:通过射频(r.f.)反应溅射从金属靶材制备TiO_(2)-WO_(3)薄膜。通过X射线衍射(XRD),X射线光电子能谱(XPS)和扫描电子显微镜(SEM)研究了薄膜的结构和形态特性。研究了退火对相组成TiO_(2)-WO_(3)体系的影响。钛和钨的结合能是Ti〜(4+)和W〜(6+)的特征。观察了钨对TiO_(2)中锐钛矿-金红石相变的影响。已经进行了结构建模以考虑钨掺杂的二氧化钛中的优选取向。

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