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Structural, optical and electrical characterization on ZnO film grown by a spray pyrolysis method

机译:喷雾热解法生长ZnO薄膜的结构,光学和电学表征

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Undoped ZnO poly crystalline films were successfully grown by a spray pyrolysis method at 300-500 degrees C. The samples grown at 500 degrees C indicated high quality because the (0002) orientation was strongly observed in the X-ray diffraction (XRD) spectrum. Surface roughness reduced with increasing substrate temperature and indium concentration. Indium doping caused the resistivity to decrease and the carrier concentration to increase. Electrical conduction types in the undoped and In-doped ZnO films indicated all n-types. From these results, this indicated that indium atoms could act as a donor type impurity. (C) 2005 Springer Science + Business Media, Inc.
机译:通过喷雾热解方法在300-500摄氏度下成功地生长了未掺杂的ZnO多晶膜。在500摄氏度下生长的样品显示出高质量,因为在X射线衍射(XRD)光谱中强烈观察到(0002)取向。表面粗糙度随衬底温度和铟浓度的升高而降低。铟掺杂导致电阻率降低而载流子浓度升高。未掺杂和In掺杂的ZnO薄膜中的导电类型表示所有n型。从这些结果可以看出,铟原子可以作为施主型杂质。 (C)2005年Springer Science + Business Media,Inc.

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