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Explanation of positive and negative PICTS peaks in SI-GaAs

机译:SI-GaAs中正和负PICTS峰的解释

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A system of rate equations was used to study the unusual behavior of the EL2 defect in SI-GaAs. Experimental results show a strong correlation between the position of the Fermi level and the appearance of either negative or positive EL2 peaks. The applied model reproduces experimental results and provides a mechanism which explains the occurrence of negative EL2 peaks. Besides the numerical simulation we also adapted a simplified trap model which leads to a qualitative understanding of the negative PICTS peak effect. Furthermore, the existence of negative peaks can be viewed as evidence for the presence of a recombination center besides the EL2 in the analyzed samples.
机译:使用速率方程系统研究SI-GaAs中EL2缺陷的异常行为。实验结果表明,费米能级的位置与负或正EL2峰的出现之间存在很强的相关性。应用的模型再现了实验结果,并提供了解释负EL2峰的发生的机制。除数值模拟外,我们还采用了简化的陷阱模型,从而对PICTS负峰效应产生了定性认识。此外,负峰的存在可以看作是分析样品中除EL2之外还存在重组中心的证据。

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