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机译:在具有La_(0.5)Sr_(0.5)CoO_3缓冲层的Pt-Si衬底上制备高耐久性Ba_(0.6)Sr_(0.4)TiO_3薄膜
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;
机译:结构,光学,非线性光学,电介质特性和LA_(0.01)BA_(0.99)TiO_3,SM_(0.5)SR_(0.5)COO_3和SM_(0.5)SR_(0.01)BA_(0.01)BA_的电子结果 (0.99)使用脉冲激光沉积(PLD)技术在石英基板上生长的TiO_3薄膜
机译:Si衬底上外延生长的(La_(0.5)Sr_(0.5))CoO_3和(La_(0.6)Sr_(0.4))MnO_3薄膜的热稳定性比较
机译:(Sr_(0.95)La_(0.05))TiO_3缓冲层基板上的(Pb_(0.5)Ba_(0.5))ZrO_3薄膜的结构和介电可调性
机译:LA_(0.5)SR_(0.5)COO_3溶胶浓度对TI衬底上溶胶 - 凝胶法制备的BA_(0.6)SR_(0.4)TiO_3膜的微观结构和介电性能的影响
机译:半透明氧化锌:低温制备的铝/铜(I)氧化物薄膜异质结:结处本征ZnO缓冲层的作用
机译:四(乙基甲基氨基)和四(二甲基氨基)前体在原子层沉积Hf0.5Zr0.5O2薄膜中铁电性能的比较研究
机译:在具有La0.5Sr0.5CoO3缓冲层的Pt-Si衬底上制备的高耐久性Ba0.6Sr0.4TiO3薄膜