...
首页> 外文期刊>Journal of materials science >High tunabilty Ba_(0.6)Sr_(0.4)TiO_3 thin films fabricated on Pt-Si substrates with La_(0.5)Sr_(0.5)CoO_3 buffer layer
【24h】

High tunabilty Ba_(0.6)Sr_(0.4)TiO_3 thin films fabricated on Pt-Si substrates with La_(0.5)Sr_(0.5)CoO_3 buffer layer

机译:在具有La_(0.5)Sr_(0.5)CoO_3缓冲层的Pt-Si衬底上制备高耐久性Ba_(0.6)Sr_(0.4)TiO_3薄膜

获取原文
获取原文并翻译 | 示例

摘要

Ba_(0.6)Sr_(0.4)TiO_3 (BST) thin films for the tunable microwave devices were grown using pulsed laser deposition (PLD) on Pt/Ti/SiO_2/Si (Pt-Si) substrates with La_(0.5)Sr_(0.5)CoO_3 (LSCO) buffer layers. For comparison, the films were also grown on Pi-Si substrates. X-ray diffraction results showed that the BST films on Pt-Si displayed a highly (110) preferred orientation, while the films with the LSCO buffer layers were (l00)-oriented. Atomic force microscope (AFM) revealed that BST films with LSCO buffer layers had smoother surface and smaller grain size. Compared with (110) BST films, the (100) BST thin films had the higher tunability and the better figure of merit (FOM). The dielectric constant, the dielectric loss and the tunability of the BST thin films on LSCO/Pt-Si substrates measured at 10 kHz were 1010, 0.031 and 82.4%, respectively. Additionally, the current-voltage(/-V) measurement indicated that the leakage current density of (100) BST thin films on LSCO/Pt-Si substrates was reduced compared with that of (110) BST thin films directly on Pt electrodes, due to the possible reduction of interface oxygen vacancies at BST/LSCO interface and smaller grain size of the films. The enhancement in dielectric properties may be attributed to (100) preferred orientation in the films.
机译:使用脉冲激光沉积(PLD)在La_(0.5)Sr_(0.5)的Pt / Ti / SiO_2 / Si(Pt-Si)衬底上生长用于可调微波器件的Ba_(0.6)Sr_(0.4)TiO_3(BST)薄膜CoO_3(LSCO)缓冲层。为了比较,该膜还生长在Pi-Si衬底上。 X射线衍射结果表明,Pt-Si上的BST薄膜具有较高的(110)优先取向,而带有LSCO缓冲层的薄膜则具有(100)取向。原子力显微镜(AFM)显示带有LSCO缓冲层的BST膜具有更光滑的表面和更小的晶粒尺寸。与(110)BST薄膜相比,(100)BST薄膜具有更高的可调性和更好的品质因数(FOM)。在10 kHz下测得的LSCO / Pt-Si衬底上BST薄膜的介电常数,介电损耗和可调谐性分别为1010%,0.031%和82.4%。另外,电流-电压(/ -V)测量表明,与直接在Pt电极上的(110)BST薄膜相比,在LSCO / Pt-Si衬底上的(100)BST薄膜的泄漏电流密度降低了。可能会降低BST / LSCO界面处的界面氧空位和减小薄膜的晶粒尺寸。介电性能的提高可归因于膜中的(100)优选取向。

著录项

  • 来源
    《Journal of materials science 》 |2008年第5期| 429-433| 共5页
  • 作者单位

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

    State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054, P.R. China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号