Micro-porous silicon structure with low optical reflection

摘要

A porous silicon structure with good physical and optical characteristics was made by a novel method. In this method, an amorphous silicon film with many fine grains was used as micro-mask. When the sample was subjected to etching process, the presence of fine grain boundaries resulted in selective etching on the surface of silicon wafer. The completed sample showed a low-reflective silicon wafer with a complex morphology. When a light illuminated on this proposed structure, there was nearly no optical reflection to be detected. This indicates that the new porous silicon structure can act as a good light-trapper.