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Thickness dependence of refractive index and optical gap of PMMA layers prepared under electrical field

机译:电场作用下制备的PMMA层的折射率与光学间隙的厚度依赖性

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Optical parameters (refractive index, dispersion energy, optical gap) of polymethylmethacrylate (PMMA) layers prepared by spin coating and modified by electric field have been studied. Refractive index was measured using a refractometer, internal structure was investigated as a structural parameter (E_d) within the One Oscillator Model. Optical gap width (E_g~(opt)) was assessed using Tauc Approximation from UV-Vis spectra. Surface morphology and roughness was investigated using an AFM. The electric field imposed during preparation of layers increases their refractive index. The highest increase in n (Δn = 0.042) was found for the thinnest PMMA layer (70 nm). Oriented layers have produced higher E_g~(opt) than non-oriented ones for all studied values of thickness. The electrical field applied at preparation of the oriented layer will not change its surface morphology and roughness.
机译:研究了旋涂制备并经电场改性的聚甲基丙烯酸甲酯(PMMA)层的光学参数(折射率,分散能,光学间隙)。使用折光仪测量折射率,在One Oscillator模型中研究内部结构作为结构参数(E_d)。使用Tauc近似从UV-Vis光谱评估光学间隙宽度(E_g〜(opt))。使用AFM研究了表面形态和粗糙度。在制备层期间施加的电场增加了它们的折射率。对于最薄的PMMA层(70 nm),n的增加最大(Δn= 0.042)。对于所有研究的厚度值,定向层产生的E_g〜(opt)高于非定向层。制备定向层时施加的电场不会改变其表面形态和粗糙度。

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