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机译:离子束溅射沉积CIS薄膜过程中硒含量的调节
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, 518060 Shenzhen, China;
rnInstitute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, 518060 Shenzhen, China;
rnInstitute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, 518060 Shenzhen, China;
rnInstitute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, 518060 Shenzhen, China;
rnInstitute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, 518060 Shenzhen, China;
机译:离子束溅射沉积CIS薄膜过程中硒含量的调节
机译:离子束溅射沉积CIS薄膜的生长与表征
机译:离子束溅射沉积CIS薄膜的生长与表征
机译:电子束沉积,离子镀,离子辅助沉积和双离子束溅射沉积二氧化硅薄膜IR和UV激光损伤电阻的对比研究
机译:通过离子束溅射沉积的介电薄膜,用于基于III-V的红外光电成像。
机译:靶成分和溅射沉积参数对沉积在聚合物基底上的氮化银-坡莫合金柔性薄膜功能性能的影响
机译:电脑仿真散射离子和溅射物种在高温超导薄膜离子束溅射沉积中的影响
机译:高温超导薄膜离子束溅射沉积中散射离子和溅射物种效应的计算机模拟