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Influence of Fe dopant concentration and annealing temperature on the structural and optical properties of ZnO thin films deposited by sol-gel method

机译:Fe掺杂浓度和退火温度对溶胶-凝胶法沉积ZnO薄膜结构和光学性能的影响

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摘要

Nanostructured Fe doped ZnO thin films were deposited onto glass substrates by sol-gel spin coating method. Influence of Fe doping concentration and annealing temperature on the structural, compositional, morphological and optical properties were investigated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), UV-Vis spectroscopy and photoluminescence (PL) measurements. XRD analysis showed that all the films prepared in this work possessed a hexagonal wurtzite structure and were preferentially oriented along the c-axis. Pure ZnO thin films possessed extensive strain, whereas Fe doped films possessed compressive strain. In the doped films, least value of stress and strain was observed in the 0.5 at.% Fe doped thin film, annealed at 873 K. Average crystallite size was not significantly affected by Fe doping, but it increased from 15.57 to 17.79 nm with increase in annealing temperature from 673 to 873 K. Fe ions are present in +3 oxidation state as revealed by XPS analysis of the 0.5 at.% Fe doped film. Surface morphology is greatly affected by changes in Fe doping concentration and annealing temperature which is evident in the SEM images. The increase in optical band gap from 3.21 to 3.25 eV, with increase in dopant concentration was attributed to Moss-Burstein shift. But increase in annealing temperature from 673 to 873 K caused a decrease in band gap from 3.22 to 3.20 eV. PL spectra showed emissions due to excitonic combinations in the UV region and defect related emissions in the visible region in all the investigated films.
机译:通过溶胶-凝胶旋涂法将纳米结构的Fe掺杂的ZnO薄膜沉积在玻璃基板上。使用X射线衍射(XRD),X射线光电子能谱(XPS),扫描电子显微镜(SEM),UV-Vis光谱法研究了Fe掺杂浓度和退火温度对结构,组成,形态和光学性质的影响。光致发光(PL)测量。 XRD分析表明,在该工作中制备的所有膜均具有六方纤锌矿结构,并优选沿c轴取向。纯ZnO薄膜具有广泛的应变,而Fe掺杂的薄膜具有压缩应变。在掺杂薄膜中,在873 K退火的0.5 at。%Fe掺杂薄膜中观察到的应力和应变的最小值。平均晶粒尺寸不受Fe掺杂的影响较大,但随着增加,其平均晶粒尺寸从15.57 nm增加到17.79 nm在673至873 K的退火温度下,Fe离子以+3氧化态存在。这是通过对0.5 at。%Fe掺杂的薄膜进行XPS分析得出的。表面形貌受Fe掺杂浓度和退火温度变化的影响很大,这在SEM图像中很明显。光学带隙从3.21 eV到3.25 eV的增加,以及掺杂剂浓度的增加归因于莫斯-伯斯坦位移。但是退火温度从673 K升高到873 K导致了带隙从3.22 eV降低到3.20 eV。 PL光谱显示,在所有研究的薄膜中,归因于紫外线区域中的激子结合而产生的发射以及可见区域中与缺陷相关的发射。

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  • 来源
    《Journal of materials science》 |2014年第1期|224-232|共9页
  • 作者单位

    Department of Physics, M.G College, Thiruvananthapuram 695004, Kerala, India;

    Department of Physics, M.G College, Thiruvananthapuram 695004, Kerala, India;

    Department of Physics, All Saints' College, Thiruvananthapuram 695007, Kerala, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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