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TiO_2/porous silicon nanocomposite passivation coating for mc-Si wafers

机译:用于mc-Si晶片的TiO_2 /多孔硅纳米复合钝化涂层

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摘要

This work reports on passivation effect of solar-grade multicrystalline Si (mc-Si) using a TiO_2/porous silicon double coating. For this purpose, TiO_2 nanoparticles were deposited onto porous silicon (PS)/mc-Si using pulsed laser ablation of titanium target. The structural and optoelectronic properties of the TiO_2/PS treated mc-Si substrates were investigated by X-ray diffraction, Raman spectroscopy, optical spectrometry, photo-conductance and photoluminescence (PL). It was found that the minority carrier lifetime (τ_(eff)) of the mc-Si wafer could enhance at a nominal thickness of the TiO_2 film (nanoparticle sizes). This was attributed to a surface passivation of the mc-Si wafer via TiO_2-passivation of the PS film, whose PL intensity improves consequently. An optimal TiO_2 thickness of 80 nm was found to give the highest PL intensity and an enhancement of the minority carrier lifetime from 5 us for untreated mc-Si wafer to about 391 us for a TiO_2/ PS treated wafers.
机译:这项工作报道了使用TiO_2 /多孔硅双涂层的太阳能级多晶硅(mc-Si)的钝化效果。为此,使用脉冲激光烧蚀钛靶材将TiO_2纳米颗粒沉积到多孔硅(PS)/ mc-Si上。通过X射线衍射,拉曼光谱,光学光谱,光电导和光致发光(PL)研究了经TiO_2 / PS处理的mc-Si衬底的结构和光电性能。已发现,在TiO_2薄膜的标称厚度(纳米粒径)下,mc-Si晶片的少数载流子寿命(τ_(eff))可以增加。这归因于通过PS膜的TiO_2钝化对mc-Si晶片进行表面钝化,从而提高了PL强度。发现最佳的TiO_2厚度为80 nm,可以提供最高的PL强度,并使少数载流子寿命从未处理的mc-Si晶片5 us延长到TiO_2 / PS处理的晶片约391 us。

著录项

  • 来源
    《Journal of materials science》 |2015年第3期|1585-1590|共6页
  • 作者单位

    Laboratoire de Photovoltaieque, Centre de Recherches et des Technologies de l'Energie, Technopole de Borj-Cedria, BP 95, 2050 Hammam-Lif, Tunisia;

    Laboratoire de Photovoltaieque, Centre de Recherches et des Technologies de l'Energie, Technopole de Borj-Cedria, BP 95, 2050 Hammam-Lif, Tunisia;

    Laboratoire de Photovoltaieque, Centre de Recherches et des Technologies de l'Energie, Technopole de Borj-Cedria, BP 95, 2050 Hammam-Lif, Tunisia;

    Institut National de la Recherche Scientifique, INRS-Energie, Materiaux et Telecommunications, 1650, Blvd. Lionel-Boulet, Varennes, QC J3X-1S2, Canada;

    Laboratoire de Photovoltaieque, Centre de Recherches et des Technologies de l'Energie, Technopole de Borj-Cedria, BP 95, 2050 Hammam-Lif, Tunisia;

    Department of Applied Physics, University of Sharjah, P.O. Box 27272, Sharjah, United Arab Emirates;

    Department of Applied Physics, University of Sharjah, P.O. Box 27272, Sharjah, United Arab Emirates;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-17 13:45:19

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