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首页> 外文期刊>Journal of materials science >Structural, optical, transient photoconductivity studies and low temperature thermoelectric power measurements on reactively evaporated lead selenide thin films
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Structural, optical, transient photoconductivity studies and low temperature thermoelectric power measurements on reactively evaporated lead selenide thin films

机译:反应蒸发的硒化铅薄膜的结构,光学,瞬态光电导性研究和低温热电功率测量

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摘要

Thin film of PbSe has been prepared on ultra-sonically cleaned glass substrate at a substrate temperature of 373 ± 5 K by reactive evaporation at a pressure of 10~5 mbar. The prepared PbSe film is characterized using X-ray diffraction, scanning electron microscopy, and UV-Vis-NIR spectrophotometer. The average particle size, number of crystallite per unit area and strain of a typical film are calculated and found as 38 nm, 3.098 × 10~(15) m~2 and 2.253 × 10~3 respectively. The room temperature electrical resistivity of the film is of the order of 0.16 Ω cm. The material possesses a direct allowed optical band gap of 2.02 eV and the absorption coefficient is found to be in the range 10~4- 10~5 cm~(-1). The weak absorption below the absorption band edge is observed and tailing in the forbidden gap is found to follow Urbach tail rule. The width of the localized states in the band gap is estimated as 256 meV. The differential life time increases with increasing decay time and the decay curve of the pho-tocurrent gives the localized energy states which act as trapping centre in the band gap of the material. The thermoelectric power measurements are done in the temperature range 10-293 K and the Fermi level is positioned at 0.039 eV above the valence band. The material possesses a Seebeck coefficient of about 137 μV K~(-1) and power factor of 0.12 × 10~(-4) Wm~(-1) K~(-2) near room temperature. The prepared films are of p-type in nature with activation energy of 0.063 eV.
机译:通过在10〜5 mbar的压力下进行反应性蒸发,在373±5 K的基板温度下,用超声波清洗过的玻璃基板制备了PbSe薄膜。使用X射线衍射,扫描电子显微镜和UV-Vis-NIR分光光度计对制备的PbSe膜进行表征。计算出典型薄膜的平均粒径,每单位面积的微晶数和应变,分别为38 nm,3.098×10〜(15)m〜2和2.253×10〜3。膜的室温电阻率约为0.16Ωcm。该材料具有2.02eV的直接允许光学带隙,并且发现吸收系数在10〜4〜10〜5cm〜(-1)的范围内。观察到在吸收带边缘以下的弱吸收,并且发现在禁带中的拖尾遵循乌尔巴赫尾法则。带隙中的局部状态的宽度估计为256 meV。微分寿命随着衰减时间的增加而增加,并且光电流的衰减曲线给出了局部能态,该能态充当了材料带隙中的俘获中心。热电功率测量在10-293 K的温度范围内完成,费米能级位于价带上方0.039 eV。该材料在室温附近的塞贝克系数约为137μVK〜(-1),功率因数为0.12×10〜(-4)Wm〜(-1)K〜(-2)。所制备的膜本质上是p型的,其活化能为0.063eV。

著录项

  • 来源
    《Journal of materials science》 |2016年第6期|5646-5653|共8页
  • 作者单位

    Solid State Physics Laboratory, Department of Physics, Cochin University of Science and Technology, Kochi, Kerala 682022, India;

    Solid State Physics Laboratory, Department of Physics, Cochin University of Science and Technology, Kochi, Kerala 682022, India;

    Solid State Physics Laboratory, Department of Physics, Cochin University of Science and Technology, Kochi, Kerala 682022, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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