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首页> 外文期刊>Journal of materials science >Growth of phases in the solid-state from room temperature to an elevated temperature in the Pd-Sn and the Pt-Sn systems
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Growth of phases in the solid-state from room temperature to an elevated temperature in the Pd-Sn and the Pt-Sn systems

机译:Pd-Sn和Pt-Sn系统中从室温到高温的固态相生长

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The solid-state growth of the product phases in bulk and electroplated diffusion couples of the Pd-Sn and the Pt-Sn systems is reported at various temperatures, ranging from room temperature to 215 ℃. The growth rate of the product phase in the Pt-Sn system is found to be much lower compared to the Pd-Sn system and the Au-Sn system also, which is currently used in the microelectronics industry. The time dependent experiments indicate that the growth rate in the Pd-Sn system is parabolic in nature, i.e., it is controlled by the diffusion rates of components through the product phases. However, the growth rate is linear and hence reaction-controlled in the Pt-Sn system, which indicates that the formation of the compound is the rate-limiting step rather than the diffusion rates of components. The PdSn_4 phase covers almost whole interdiffusion zone in the Pd/Sn couple, while PtSn_4 is the only phase found in the Pt/Sn couple. The marker experiments indicate that both PdSn_4 and PtSn_4 grow mainly by the diffusion of Sn, with negligible diffusion of Pd and Pt, respectively. Furthermore, the analysis considering the same crystal structure (i.e., oC20) of these phases along with the concept of sublattice diffusion mechanism indicates that the diffusion rates of both Pd and Pt are negligible via both the lattice and the grain boundaries.
机译:据报道,Pd-Sn和Pt-Sn系统的本体和电镀扩散对中产物相的固态生长在室温至215℃的不同温度下进行。发现与目前在微电子工业中使用的Pd-Sn系统和Au-Sn系统相比,Pt-Sn系统中产物相的生长速率要低得多。随时间变化的实验表明,Pd-Sn系统中的生长速率本质上是抛物线形的,即,它受组分在产物相中的扩散速率的控制。但是,生长速率是线性的,因此在Pt-Sn系统中受反应控制,这表明化合物的形成是速率限制步骤,而不是组分的扩散速率。 PdSn_4相几乎覆盖了Pd / Sn对中的整个扩散区域,而PtSn_4是Pt / Sn对中唯一的相。标记实验表明,PdSn_4和PtSn_4均主要通过Sn的扩散而生长,而Pd和Pt的扩散分别可忽略不计。此外,考虑这些相的相同晶体结构(即,O 2 O 20)的分析以及亚晶格扩散机理的概念表明,通过晶格和晶界,Pd和Pt的扩散速率均可以忽略。

著录项

  • 来源
    《Journal of materials science 》 |2017年第24期| 18379-18386| 共8页
  • 作者单位

    Department of Materials Engineering, Indian Institute of Science, Bangalore 560012, Karnataka, India;

    Department of Materials Engineering, Indian Institute of Science, Bangalore 560012, Karnataka, India;

    Department of Materials Engineering, Indian Institute of Science, Bangalore 560012, Karnataka, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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