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Electrochemical migration of Ni and ENIG surface finish during Environmental test contaminated by NaCl

机译:NaCl污染的环境测试中Ni和ENIG表面光洁度的电化学迁移

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摘要

The electrochemical migration (ECM) mechanism occurs at the presence of moisture in the case of operating circuits and results in shorts (dendrites) between adjacent conductor lines/traces. Dendrite growth occurs as a result of metal ions being dissolved into a solution from the anode and deposited at the cathode, thereby growing in treelike formations. In this study the water condensation process and ECM behavior of Nickel (Ni), Electroless Nickel Immersion Gold (ENIG) and pure copper were investigated using Thermal Humidity and Bias (THB) test in NaCl environment. The THB results show that Cu has higher ECM resistance than Ni and ENIG surface finishes, which was an unexpected result. The main influencing factors of the water condensation (e.g.: surface roughness, thermal parameters) and the ECM processes (precipitates and dendrites) were investigated and discussed in details. Furthermore, a novel ECM model for Ni and NiAu surface finish was established using THB test in case NaCl contaminated samples.
机译:在电路工作的情况下,电化学迁移(ECM)机制在存在水分的情况下发生,并导致相邻导体线/走线之间的短路(枝晶)。由于金属离子从阳极溶解到溶液中并沉积在阴极上,因此树状生长,从而导致枝晶生长。在这项研究中,使用NaCl环境中的热湿和偏压(THB)试验研究了镍(Ni),化学镍浸金(ENIG)和纯铜的水凝结过程和ECM行为。 THB结果表明,Cu具有比Ni和ENIG表面光洁度更高的ECM电阻,这是出乎意料的结果。研究并详细讨论了水凝结的主要影响因素(例如:表面粗糙度,热参数)和ECM过程(沉淀和枝晶)。此外,在NaCl污染样品的情况下,使用THB测试建立了针对Ni和NiAu表面光洁度的新型ECM模型。

著录项

  • 来源
    《Journal of materials science》 |2017年第24期|18578-18584|共7页
  • 作者

    Balint Medgyes;

  • 作者单位

    Department of Electronics Technology, Budapest University of Technology and Economics, Egry Jozsef street 18., Building V1, Ground floor, Budapest 1111, Hungary;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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