首页> 外文期刊>Journal of materials science >The structural and multiferroic properties of Bi_((1-x))Ce_xFe_((1-x))(Mg_(0.5)Ti_(0.5))xO_3 thin films
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The structural and multiferroic properties of Bi_((1-x))Ce_xFe_((1-x))(Mg_(0.5)Ti_(0.5))xO_3 thin films

机译:Bi _((1-x))Ce_xFe _((1-x))(Mg_(0.5)Ti_(0.5))xO_3薄膜的结构和多铁性

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摘要

Bi_(((1-x))Ce_xFe_((1-x))(Mg_(0.5)Ti_(0.5))_xO_3 (x=0, 0.05, 0.10, 0.20, 0.25) thin films were synthesized by a sol-gel method. The structural, electrical and magnetic properties of Bi_((1-x))Ce_xFe_((1-x))(Mg_(0.5)Ti_(0.5))_xO_3 (x=0, 0.05, 0.10, 0.20, 0.25) thin films have been investigated. BiFeO_3 thin film possessed a perovskite-type rhombohedral structure with space group R3c, and the average grain size decreased as the concentration of Ce, Mg and Ti co-doping increased. The leakage current densities of BiFeO_3 co-doping with Ce, Mg and Ti ions exhibited a significant reduction compared with that of BiFeO_3 thin film. Compared with the leakage current density of BiFeO_3 thin film (4.19×10~(-4) A/cm~2), the leakage current density of Bi_(0.80)Ce_(0.20)Fe_(0.80)Mg_(0.10)Ti_(0.10)O_3 thin film was reduced by about four orders of magnitude (1.05 × 10~(-8) A/cm~2) under the electric field of 300 kV/cm. Well-defined ferroelectric loops were obtained and the polarization increased with the increase of Ce, Ti and Mg co-doping. The remanent polarization of Bi_(0.80)Ce_(0.20)Fe_(0.80)Mg_(0.10)Ti_(0.10)O_3 thin film (2P_r ~34.9 μC/cm~2) was approximately four times larger than that of pure BiFeO_3 (2P_r ~7.8 uC/cm~2) under the applied field of 300 kV/cm. The magnetization under 10 kOe magnetic field of Bi_((1-x))Ce_xFe_((1-x))(Mg_(0.5)Ti_(0.5))_xO_3 thin films increased with the increasing concentration of Ce, Mg and Ti co-doping. The improvement of magnetic behaviors for BiFeO_3 co-doping with Ce, Mg and Ti ions thin films were observed significantly, cooperating with the enhanced ferroelectricity which indicated that BiFeO_3 co-doping with Ce, Mg and Ti ions thin films will be the promising materials in the application to magnetoelectric devices.
机译:通过溶胶-凝胶法合成Bi _((((1-x))Ce_xFe _((1-x))(Mg_(0.5)Ti_(0.5))_ xO_3(x = 0,0.05,0.10,0.20,0.25)薄膜Bi _((1-x))Ce_xFe _((1-x))(Mg_(0.5)Ti_(0.5))_ xO_3(x = 0,0.05,0.10,0.20,0.25)的结构,电磁性能BiFeO_3薄膜具有钙钛矿型菱面体结构,空间群为R3c,随着Ce,Mg和Ti共掺杂浓度的增加,平均晶粒尺寸减小; BiFeO_3共掺杂的漏电流密度。与BiFeO_3薄膜相比,Ce,Mg和Ti离子的还原电流显着降低;与BiFeO_3薄膜的泄漏电流密度(4.19×10〜(-4)A / cm〜2)相比,CuFe薄膜的泄漏电流密度显着降低。 Bi_(0.80)Ce_(0.20)Fe_(0.80)Mg_(0.10)Ti_(0.10)O_3薄膜在电场下减少了四个数量级(1.05×10〜(-8)A / cm〜2) 300 kV / cm,获得了清晰的铁电回路,并且极化随着Ce,Ti和Mg共掺杂的增加。 Bi_(0.80)Ce_(0.20)Fe_(0.80)Mg_(0.10)Ti_(0.10)O_3薄膜(2P_r〜34.9μC/ cm〜2)的剩余极化约为纯BiFeO_3(2P_r〜 7.8 uC / cm〜2)在300 kV / cm的施加电场下。 Bi _((1-x))Ce_xFe _((1-x))(Mg_(0.5)Ti_(0.5))_ xO_3薄膜在10 kOe磁场下的磁化强度随着Ce,Mg和Ti的浓度增加而增加掺杂。明显观察到与Fe,Ce,Mg和Ti离子薄膜共掺杂的BiFeO_3的磁性能得到改善,这与铁电增强相结合,表明BiFeO_3与Ce,Mg和Ti离子薄膜共掺杂将是有希望的材料。在磁电设备中的应用。

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  • 来源
    《Journal of materials science》 |2017年第22期|16895-16902|共8页
  • 作者单位

    State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering/School of Physics, Sun Yat-sen University, Guangzhou 510275, China;

    State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering/School of Physics, Sun Yat-sen University, Guangzhou 510275, China;

    State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering/School of Physics, Sun Yat-sen University, Guangzhou 510275, China;

    State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering/School of Physics, Sun Yat-sen University, Guangzhou 510275, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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