...
首页> 外文期刊>Journal of materials science >Deposit on different back contacts: to high-quality CulnGaS_2 thin films for photovoltaic application
【24h】

Deposit on different back contacts: to high-quality CulnGaS_2 thin films for photovoltaic application

机译:沉积在不同的背面触点上:用于光伏应用的高质量CulnGaS_2薄膜

获取原文
获取原文并翻译 | 示例

摘要

Cu(In,Ga)Se_2 (CIGS) absorber layer for photovoltaic application was successfully deposited by different substrate, indium tin oxide (ITO), fluorine-doped tin oxide (FTO) and molybdenum (Mo) after optimization of the operating parameters of the deposited films. The structural, morphological, optical and electrical properties of the CIGS films were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The inter-planar distance between the planes is estimated at 0.36 nm. Atomic force microscopy (AFM) samples deposited on Mo had the highest level of 751 nm for roughness compared to other samples. High absorbance and low transmittance are observed for films prepared with a shot interval energy of about 1.6 eV. Optical constants such as the refractive index (n), the extinction coefficient (k), the real part (ε_r) and the imaginary part (ε_i) of the dielectric constant were extracted from the data of absorb-ance/transmittance. The optoelectronic properties of this CuInGaS_2 material make it advisable to use it for the manufacture of more efficient solar panels.
机译:通过优化衬底的工作参数,成功地通过不同的衬底,氧化铟锡(ITO),掺氟氧化锡(FTO)和钼(Mo)成功沉积了用于光伏应用的Cu(In,Ga)Se_2(CIGS)吸收层。沉积膜。通过X射线衍射(XRD),扫描电子显微镜(SEM)和透射电子显微镜(TEM)分析了CIGS膜的结构,形态,光学和电学性质。平面之间的平面间距离估计为0.36 nm。与其他样品相比,沉积在Mo上的原子力显微镜(AFM)样品具有751 nm的最高水平。对于以约1.6eV的发射间隔能量制备的膜,观察到高吸收率和低透射率。从吸收率/透射率的数据中提取出介电常数的折射率(n),消光系数(k),实部(ε_r)和虚部(ε_i)等光学常数。这种CuInGaS_2材料的光电性能使其可用于制造更高效的太阳能电池板。

著录项

  • 来源
    《Journal of materials science 》 |2019年第23期| 20832-20839| 共8页
  • 作者单位

    Institut de Disseny i Fabricacio Universitat Politecnica Cami de Vera s 46022 Valencia Spain Laboratoiry LMEE Faculte des Sciences de Kenitra BP 133 Kenitra Morocco MAC &PM Laboratory ANEPMAER Group FSTM B.P 146 Mohamedia Morocco CeFEMA IST-U Lisboa Lisbon Portugal;

    Institut de Disseny i Fabricacio Universitat Politecnica Cami de Vera s 46022 Valencia Spain;

    MAC &PM Laboratory ANEPMAER Group FSTM B.P 146 Mohamedia Morocco;

    Laboratoiry LMEE Faculte des Sciences de Kenitra BP 133 Kenitra Morocco;

    CeFEMA IST-U Lisboa Lisbon Portugal;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号