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首页> 外文期刊>Journal of materials science >Influence of In-doping on microstructure, optical and electrical properties of sol-gel derived CdO thin films
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Influence of In-doping on microstructure, optical and electrical properties of sol-gel derived CdO thin films

机译:In掺杂对溶胶-凝胶法制备的CdO薄膜的微观结构,光学和电学性质的影响

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摘要

Cadmium oxide thin films have been prepared on glass substrates by the sol–gel (SG) spin-coating technique. The structural, optical and electrical properties of the prepared films were studied as a function of the thicknesses. The results show that the optimum thickness for preparation of CdO films with high optical transparency and low resistivity is 211 nm. By using this optimized thicknesses and the same experimental conditions, transparent indium-doped cadmium oxide (In–CdO) thin films were deposited and annealed at 450 °C. Transparent and conducting In–CdO thin films for various concentrations of indium (1, 3 and 5 wt%), were prepared using the SG method. The electrical, optical and structural properties of these In–CdO films were investigated using different techniques, such as Hall measurements, optical transmission and X-ray diffraction (XRD). XRD patterns show that the films are polycrystalline. The structural analysis shows that all the samples have a cubic structure. Field emission scanning electron microscopy analysis reveals that the average grain size and surface morphology of CdO films are effectively changed by various In-doping concentrations. A minimum resistivity of 0.51 × 10_(−3) Ω cm and carrier concentration of 5.43 × 10_(20) cm_(−3)with high transmittance ~ 80% in the range 350–800 nm were achieved for 3 wt% indium doping. The band gap value starts at 2.32 eV for the undoped film and increases with doping concentration reaching the value of 3.07 eV for 5 wt% indium doping.
机译:通过溶胶-凝胶(SG)旋涂技术在玻璃基板上制备了氧化镉薄膜。研究了所制备的膜的结构,光学和电学性质与厚度的关系。结果表明,制备具有高光学透明性和低电阻率的CdO薄膜的最佳厚度为211nm。通过使用这种优化的厚度和相同的实验条件,可以沉积透明的掺杂铟的氧化镉(In–CdO)薄膜,并在450°C的温度下进行退火。使用SG方法制备了各种浓度的铟(1、3和5 wt%)的透明导电In-CdO薄膜。这些In–CdO薄膜的电,光学和结构特性是使用不同的技术进行研究的,例如霍尔测量,光学透射和X射线衍射(XRD)。 XRD图谱表明该膜是多晶的。结构分析表明,所有样品均具有立方结构。场发射扫描电子显微镜分析表明,CdO薄膜的平均晶粒尺寸和表面形态会因各种In-掺杂浓度而有效改变。铟掺杂量为3 wt%时,在350-800 nm范围内具有〜80%的高透射率,最小电阻率为0.51××10 _(-3)厘米,载流子浓度为5.43×10_(20)cm _(-3)。对于未掺杂的薄膜,带隙值从2.32 eV开始,并随着掺杂浓度达到5 wt%铟掺杂的3.07 eV值而增加。

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  • 来源
    《Journal of materials science》 |2018年第13期|11286-11295|共10页
  • 作者单位

    Laboratoire de Semi-conducteurs, des Nano-structures et des Technologie Avancées, Centre de Recherches et des Technologies de l’Energie, Technopole de Borj-Cédria,Faculté des Sciences de Bizerte;

    Ecole Supérieure des Sciences et Technologies du Design, Université de la Manouba;

    Laboratoire de Semi-conducteurs, des Nano-structures et des Technologie Avancées, Centre de Recherches et des Technologies de l’Energie, Technopole de Borj-Cédria;

    Laboratoire de Semi-conducteurs, des Nano-structures et des Technologie Avancées, Centre de Recherches et des Technologies de l’Energie, Technopole de Borj-Cédria,Faculté des Sciences de Bizerte;

    Ecole Nationale d’Electronique et des Télécommunications de Sfax, Université de Sfax;

    National Hellenic Research Foundation, Theoretical and Physical Chemistry Institute;

    National Hellenic Research Foundation, Theoretical and Physical Chemistry Institute;

    Laboratoire de Semi-conducteurs, des Nano-structures et des Technologie Avancées, Centre de Recherches et des Technologies de l’Energie, Technopole de Borj-Cédria;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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