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Effects of cobalt doping on the electrical properties of MBE-grown ZnO

机译:钴掺杂对MBE生长的ZnO电学性能的影响

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We investigated n-conducting Co-doped ZnO epilayers grown by MBE with a cobalt content of nominal 4, 12, and 18 at.% by means of deep level transient spectroscopy (DLTS) and resistivity measurements. We found that in materials grown at the same substrate temperature, 500 °C, the resistivity decreases with the cobalt mole fraction. The free electron concentration accounts for most of the change in the resistivity. The DLTS measurements reveal the presence of a defect center located at Ec−0.5 eV, which is (1) metastable; (2) sensitive to annealing in oxygen-free ambient, and (3) decreasing in density in the samples with higher cobalt content. We therefore assign the center to the isolated oxygen vacancy. Furthermore, our results support the hypothesis that ferromagnetism in ZnO:Co is mediated by Co-oxygen vacancy pairs.
机译:我们通过深层瞬态光谱法(DLTS)和电阻率测量研究了MBE生长的n导电共掺杂ZnO外延层,其钴含量分别为4、12和18 at。%。我们发现,在相同的衬底温度(500°C)下生长的材料中,电阻率随钴摩尔分数的降低而降低。自由电子浓度占电阻率变化的大部分。 DLTS测量揭示了位于E c -0.5 eV处的缺陷中心,该缺陷中心是(1)亚稳态的; (2)在无氧环境中对退火敏感,(3)钴含量较高的样品密度降低。因此,我们将中心分配给隔离的氧气空位。此外,我们的结果支持以下假设:ZnO:Co中的铁磁性是由Co-氧空位对介导的。

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