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首页> 外文期刊>Journal of Materials Research >Structural characterization of laser ablated epitaxial (Ba_0.5Sr_0.5)TiO_3 thin films on MgO(001) by synchrotron x-ray scattering
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Structural characterization of laser ablated epitaxial (Ba_0.5Sr_0.5)TiO_3 thin films on MgO(001) by synchrotron x-ray scattering

机译:同步辐射X射线散射在MgO(001)上激光烧蚀外延(Ba_0.5Sr_0.5)TiO_3薄膜的结构表征

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Epitaxial (Ba_0.5Sr_0.5)TiO_3 thin films of two different thickness (~25 and ~134 nm) on MgO(00l) prepared by a pulsed laser deposition method were studied by synchrotron x-ray scattering measurements. The film grew initially with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became significantly rougher, but the interface between the film and the substrate did not. In the early stage of growth, the film was highly strained in a tetragonal structure (c/a = 1.04) with the longer axis parallel to the surface normal direction. As the growth proceeded further, it relaxed to a cubic structure with the lattice parameter near the bulk value, and the mosaic distribution improved significantly in both in- and out-of plane directions. The thinner film (~25 nm) showed only one domain limited mainly by the film thickness, but the thicker film (~l34 nm) exhibited three domains along the surface normal direction.
机译:通过同步加速器X射线散射测量研究了通过脉冲激光沉积法在MgO(00l)上制备的两种不同厚度(〜25和〜134 nm)的外延(Ba_0.5Sr_0.5)TiO_3薄膜。这部电影最初以立方对立方的关系成长,并在进一步成长中保持下去。随着膜的生长,膜的表面变得明显更粗糙,但膜与基材之间的界面却没有。在生长的早期阶段,薄膜以四边形结构(c / a = 1.04)高度应变,其长轴平行于表面法线方向。随着生长的进一步进行,它松弛为立方结构,其晶格参数接近整体值,并且镶嵌分布在平面内和平面外方向上均得到显着改善。较薄的薄膜(〜25 nm)仅显示一个主要受薄膜厚度限制的区域,而较厚的薄膜(〜134 nm)则沿表面法线方向显示三个区域。

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