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首页> 外文期刊>Journal of Materials Research >Ferroelectric property of epitaxial Bi_4Ti_3O_12 films prepared by metalorganic chemical vapor deposition
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Ferroelectric property of epitaxial Bi_4Ti_3O_12 films prepared by metalorganic chemical vapor deposition

机译:金属有机化学气相沉积法制备Bi_4Ti_3O_12外延薄膜的铁电性能

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摘要

The orientation dependence of the ferroelectricity of epitaxially grown Bi_4Ti_3O_12 thin films was investigated. The (001)-, (118)-, and (104)-oriented Bi_4Ti_3O_12 films were epitaxially grown on (100)c CaRuO_3//(100)SrTiO_3, (110)cSrRuO_3//(110)SrTiO_3, and (111)c SrRuO_3//(111)SrTiO_3 substrates, respectively, by metalorganic chemical vapor deposition. Ferroelectric property with different magnitude was observed for (001)- and (118)-oriented films but for (104)-oriented film due to its large leakage current. The remanent polarization and the coercive field were 1.5 μC/cm~2 for (001)- and And (118)-oriented films but for (104)-oriented film due to its large leakage current. The remanent polarization and the coercive field were 1.5 μC/cm~2 and 15 kV/cm, 16.5 μC/cm~2 and 132 kV/cm for the (001)- and (118)-oriented thin films, respectively.
机译:研究了外延生长的Bi_4Ti_3O_12薄膜的铁电的取向依赖性。在(100)c CaRuO_3 //(100)SrTiO_3,(110)cSrRuO_3 //(110)SrTiO_3和(111)上外延生长(001)-,(118)-和(104)取向的Bi_4Ti_3O_12膜。 c通过金属有机化学气相沉积分别制备SrRuO_3 //(111)SrTiO_3衬底。对于(001)-和(118)-取向的膜观察到不同幅度的铁电性质,但是对于(104)-取向的膜由于其大的漏电流而观察到。 (001)取向膜和And(118)取向膜的剩余极化和矫顽场为1.5μC/ cm〜2,而(104)取向膜的剩余电流由于其大的漏电流。 (001)取向薄膜和(118)取向薄膜的剩余极化强度和矫顽场分别为1.5μC/ cm〜2和15 kV / cm,16.5μC/ cm〜2和132 kV / cm。

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