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首页> 外文期刊>Journal of Materials Research >Quantitative measurements of subcritical debonding of Cu films from glass substrates
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Quantitative measurements of subcritical debonding of Cu films from glass substrates

机译:从玻璃基板亚临界剥离铜膜的定量测量

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摘要

A driver film method, in which a highly stressed overlayer is deposited to de-adhere a target film from a substrate, was developed to study the subcritical debonding behavior of Cu films from glass substrates. The driving force for debonding along Cu/glass interfaces was varied by depositing Cr overlayers to a range of thicknesses. One-dimensional crack growth was achieved by using C release layers and cutting strips from blanket films. Crack velocities, nu, were measured and a wide strip solution was developed to obtain strain energy release rates, G. The Cu/Cr strips delaminated in a highly reproducible way, generating nu-G plots similar to those seen in stress-corrosion cracking of bulk glass. Small variations in the amount of oxygen incorporated into the films during deposition strongly affected delamination rates. A reaction rate model for subcritical cracking by hydroxylation of the surfaces suggests that changes in oxygen content change the density of strong Cu-O-Si bonds across the interface.
机译:开发了一种驱动器薄膜方法,其中沉积了高应力的覆盖层以从基板上剥离目标薄膜,从而研究了玻璃基板上Cu薄膜的亚临界剥离性能。通过沉积Cr覆盖层至一定厚度范围,可以改变沿Cu /玻璃界面剥离的驱动力。一维裂纹扩展是通过使用C脱模层和覆盖薄膜切割条来实现的。测量了裂纹的速度nu,并开发了宽条带解决方案以获得应变能释放率G。Cu / Cr条带以高度可复制的方式分层,生成的nu-G图类似于在应力腐蚀开裂中看到的图。大块玻璃。沉积过程中掺入薄膜中的氧气量的微小变化会严重影响分层速度。通过表面羟基化进行亚临界裂解的反应速率模型表明,氧含量的变化会改变整个界面上牢固的Cu-O-Si键的密度。

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