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首页> 外文期刊>Journal of Materials Research >Magnetic and electrical characteristics in dense Fe-Ni alloy cluster-assembled films prepared by energetic cluster deposition
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Magnetic and electrical characteristics in dense Fe-Ni alloy cluster-assembled films prepared by energetic cluster deposition

机译:高能团簇沉积法制备致密的Fe-Ni合金团簇膜的磁电特性

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摘要

Fe-Ni alloy cluster-assembled films were obtained by a plasma-gas-condensation-type cluster-deposition method. We studied the magnetic and electrical properties of these assemblies prepared on an electrically grounded substrate [bias voltage (V_a) = 0 kV] and on a negatively biased substrate (V_a = -20 kV). The packing density and saturation magnetization per volume, M_s, are much larger for the assemblies prepared at V_a = -20 kV than those prepared at V_a = 0 kV, while the magnetic coercivity, H_c, and electrical resistivity, p, are much lower for the assemblies prepared at V_a = -20 kV than those prepared at V_a = 0 kV. For Ni-rich Fe-Ni alloy cluster-assembled films obtained at V_a = -20 kV, the H_c values can become smaller than 160 A/m (the precision limit of our superconducting quantum interference device magnetometer) by adjusting the initial cluster size. The magnetic and electrical properties of Fe-Ni cluster-assembled films are much improved in comparison with those of pure Fe cluster-assembled films.
机译:通过等离子气体冷凝型簇沉积法获得Fe-Ni合金簇组装膜。我们研究了在电接地基板上(偏置电压(V_a)= 0 kV)和在负偏压基板上(V_a = -20 kV)制备的这些组件的磁性能和电性能。在V_a = -20 kV时制备的组件的堆积密度和单位体积的饱和磁化强度M_s比在V_a = 0 kV时制备的组件大得多,而磁矫顽力H_c和电阻率p则低得多。 V_a = -20 kV时准备的组件比V_a = 0 kV时准备的组件。对于以V_a = -20 kV获得的富镍Fe-Ni合金簇组装膜,通过调节初始簇尺寸,H_c值可变得小于160 A / m(我们的超导量子干涉仪磁力计的精度极限)。与纯铁团簇薄膜相比,Fe-Ni团簇薄膜的磁性和电学性能有了很大的提高。

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