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Structure and Magnetic Properties of Spattered Nd-Fe-B Alloys

机译:飞溅的Nd-Fe-B合金的结构和磁性

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摘要

Studies were conducted on the relationship between the composition of Nd-Fe-B alloys, the temperature of the substrate, additional heat treatment and magnetic properties, crystalline phases, and microstructure and texture of films 30 to 300 mum thick produced by ion-plasma sputtering of cast targets. The sputtering rate was maintained at approx 30 mum/h. The axial crystalline texture (001) along the normal to the sputtering plane is formed at a sputtering temperature within the limits ranging from 300 to 450 deg C and higher than 600 deg C. In the intermediate domain of sputtering temperatures, there is a deterioration of the texture (001), or such a change of the indices of the texture when the normal to one of the planes of the zone [010] becomes its axis. Within the framework of the classical theory of crystallization, a model of growth texture formation during the course of sputtering is suggested. The model explains the nonmonotonic change of texture with the change of sputtering temperature. The data obtained about the structure and properties of films have made it possible to optimize the sputtering process with a view to obtaining sputtered magnets with very good permanent magnet properties. Examples of magnetic systems and devices with sputtered magnets are given.
机译:研究了Nd-Fe-B合金的成分,基底温度,附加热处理和磁性能,结晶相以及离子等离子体溅射产生的30至300μm厚的膜的微观结构和织构之间的关系。的投射目标。溅射速率保持在约30μm/ h。沿着溅射平面的法线的轴向晶体织构(001)是在溅射温度范围为300至450摄氏度且高于600摄氏度的范围内形成的。在溅射温度的中间范围内,存在当区域[010]的其中一个平面的法线成为其轴时,纹理(001)或纹理索引的这种变化。在经典的结晶理论的框架内,提出了在溅射过程中生长纹理形成的模型。该模型解释了随着溅射温度的变化,织构的非单调变化。获得的关于膜的结构和性能的数据使得可以优化溅射工艺,以期获得具有非常好的永磁性能的溅射磁体。给出了具有溅射磁体的磁性系统和设备的示例。

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