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机译:结构性障碍对DC磁控溅射Ni薄膜物理性质和电子结构的影响
G. V. Kurdyumov Institute for Metal Physics N.A.S. of Ukraine 36 Academician Vernadsky Boulevard UA-03142 Kyiv Ukraine;
G. V. Kurdyumov Institute for Metal Physics N.A.S. of Ukraine 36 Academician Vernadsky Boulevard UA-03142 Kyiv Ukraine;
Donetsk Physical and Technical Institute of the N.A.S. of Ukraine Nauki 46 03028 Kyiv Ukraine;
Thin magnetic films; Amorphous state; Magnetic properties; Magneto-optical and optical properties; Spin-polarization degree of charge careers; Electronic structure;
机译:直流磁控溅射,脉冲直流磁控溅射和阴极电弧蒸发沉积的Ti膜的结构和性能
机译:直流磁控溅射制备Ni-Al共掺杂ZnO薄膜的微观结构,光学和电学性质
机译:直流磁控溅射和大功率脉冲磁控溅射在不同工作压力下沉积的AlN薄膜的结构性能和残余应力的比较
机译:直流磁控共溅射沉积在SiO2 / Si(100)上633 K的Ni33Fe67和Ni21Fe79薄膜的结构,电磁性能
机译:射频磁控溅射未掺杂镧锰矿薄膜的结构,磁性和表面特性。
机译:磁控溅射镍/碳多层膜中层厚度变化的微观结构演变
机译:直流反应磁控溅射制备纳米结构Cr掺杂CdO薄膜的温度依赖性结构和光学性质