首页> 外文期刊>Journal of magnetism and magnetic materials >Role of magnetic exchange interaction due to magnetic anisotropy on inverse spin Hall voltage at FeSi_(3%)/Pt thin film bilayer interface
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Role of magnetic exchange interaction due to magnetic anisotropy on inverse spin Hall voltage at FeSi_(3%)/Pt thin film bilayer interface

机译:FeSi_(3%)/ Pt薄膜双层界面上由于磁各向异性引起的磁交换相互作用对逆自旋霍尔电压的作用

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In our recent studies inverse spin Hall voltage (ISHE) was investigated by ferromagnetic resonance (FMR) using bilayer FeSi_(3%)/Pt thin film prepared by pulsed laser deposition (PLD) technique. In ISHE measurement microwave signal was applied on FeSi_(3%) film along with DC magnetic field. Higher magnetization value along the film-plane was measured by magnetic hysteresis (M-H) loop. Presence of magnetic anisotropy has been obtained by M-H loop which showed easy direction of magnetization when applied magnetic field is parallel to the film plane. The main result of this study is that FMR induced inverse spin Hall voltage 12.6 µV at 1.0 GHz was obtained across Pt layer. Magnetic exchange field at bilayer interface responsible for field torque was measured 6 × 10~(14) Ω~(-1) m~(-2) by spin Hall magnetoresistance. The damping torque and spin Hall angle have been evaluated as 0.084 and 0.071 respectively. Presence of Si atom in FeSi_(3%) inhomogenize the magnetic exchange field among accumulated spins at bilayer interface and feebly influenced by spin torque of FeSi_(3%) layer. Weak field torque suppresses the spin pumping to Ft layer thus low value of inverse spin Hall voltage is obtained. This study provides an excellent opportunity to investigate spin transfer torque effect, thus motivating a more intensive experimental effort for its utilization at maximum potential. The improvement in spin transfer torque may be useful in spin valve, spin battery and spin transistor application.
机译:在我们最近的研究中,使用铁磁共振(FMR)研究了使用自旋脉冲激光沉积(PLD)技术制备的双层FeSi_(3%)/ Pt薄膜形成的反自旋霍尔电压(ISHE)。在ISHE测量中,将微波信号与DC磁场一起施加到FeSi_(3%)薄膜上。通过磁滞(M-H)回路测量了沿薄膜平面的较高磁化值。通过M-H环获得了磁各向异性,当施加的磁场平行于膜平面时,M-H环显示出容易磁化的方向。这项研究的主要结果是,在Pt层上获得了FMR诱导的1.0 GHz处的自旋霍耳逆电压12.6 µV。通过自旋霍尔磁阻测量了负责磁场转矩的双层界面处的磁场交换磁场,其大小为6×10〜(14)Ω〜(-1)m〜(-2)。阻尼扭矩和自旋霍尔角分别评估为0.084和0.071。 FeSi_(3%)中Si原子的存在使双层界面处累积的自旋之间的磁场交换不均匀,并且受FeSi_(3%)层自旋扭矩的影响很小。弱磁场转矩抑制了自旋泵浦到Ft层,因此获得了较低的反向自旋霍尔电压值。这项研究提供了一个极好的机会来研究自旋传递扭矩的影响,从而激发了更多的实验努力以最大程度地利用它。自旋传递扭矩的改善在自旋阀,自旋电池和自旋晶体管的应用中可能是有用的。

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