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Study of the blue luminescence in unintentional doped GaN films grown by MOCVD

机译:MOCVD生长的无意掺杂GaN薄膜中的蓝色发光研究

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摘要

We studied the blue luminescence at about 2.9 eV in unintentional doped GaN films, which were grown on (0 0 0 1) oriented sapphire substrates by MOCVD. The intensity ratio of the blue luminescence to the band-edge emission is large in high compensation ratio's GaN films, and it decreases with the decrease of the compensation ratio. The FWHM of double-crystal X-ray diffraction obviously increases with the increase of the intensity ratio of the blue luminescence to the band-edge emission. Our results indicate that blue luminescence is the transition from the free electron to acceptor levels that are due to some intrinsic defects. We also observed that the peak position of the blue luminescence shifted to higher energy with decreasing excitation density in a high background electron carrier concentration GaN sample. We consider that this phenomenon is due to the screening effects of the free carriers.
机译:我们研究了无意掺杂的GaN薄膜在约2.9 eV处的蓝色发光,该薄膜通过MOCVD在(0 0 0 1)取向的蓝宝石衬底上生长。在高补偿率的GaN膜中,蓝色发光与带边缘发射的强度比大,并且随着补偿率的降低而降低。双晶X射线衍射的半高宽随着蓝光与边沿发射的强度比的增加而明显增加。我们的结果表明,蓝色发光是由于某些固有缺陷导致的从自由电子到受体能级的跃迁。我们还观察到,在高背景电子载流子浓度GaN样品中,随着激发密度的降低,蓝色发光的峰位置移至更高的能量。我们认为这种现象是由于自由载体的筛选作用所致。

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